Self-induced preparation of TiSi nanopins by chemical vapor deposition

Nanotechnology

Volumn 18, Issue 34, 2007, Pages

  Du, Jun ^a,b   Du, Piyi ^a   Hao, Peng ^a   Huang, Yanfei ^a   Ren, Zhaodi ^a   Weng, Wenjian ^a   Han, Gaorong ^a   Zhao, Gaoling ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b NANCHANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

NANOPINS; ORTHORHOMBIC TISI CRYSTALS; SELF INDUCTION MECHANISM;

CHEMICAL VAPOR DEPOSITION; NANOSTRUCTURED MATERIALS; SINGLE CRYSTALS;

TITANIUM COMPOUNDS;

CRYSTALLIN; NANOMATERIAL; NANOPARTICLE; NANOPIN; NANOROD; SILANE DERIVATIVE; SILICON; TITANIUM; TITANIUM DERIVATIVE; TITANIUM SILICIDE; TITANIUM TETRACHLORIDE; UNCLASSIFIED DRUG;

ARTICLE; COMPREHENSION; CRYSTAL; DENSITY; GAS; PRECURSOR; PRIORITY JOURNAL; VAPOR;

EID: 34547735524     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/34/345605     Document Type: Article

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