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Volumn 514-516, Issue PART 2, 2006, Pages 1161-1165

Effect of processing conditions on the microstructure and electrical resistance of nanocrystalline ITO thin films made by laser ablation

Author keywords

Electrical resistance; ITO; Laser ablation; Porosity; Thin films

Indexed keywords

ELECTRIC RESISTANCE; GROWTH RATE; INDIUM COMPOUNDS; LASER ABLATION; MICROSTRUCTURE; NANOCRYSTALLINE MATERIALS; POROSITY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION;

EID: 34547703857     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/msf.514-516.1161     Document Type: Conference Paper
Times cited : (3)

References (15)
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    • R.B.H. Tahar et al.: J. Appl. Phys. Vol. 83 (5) (1998), p. 2631
    • (1998) J. Appl. Phys , vol.83 , Issue.5 , pp. 2631
    • Tahar, R.B.H.1
  • 14
    • 0001559611 scopus 로고    scopus 로고
    • R. Teghil et al.: Appl. Surf. Sci. Vol. 138-139 (1999), p. 522
    • (1999) Appl. Surf. Sci , vol.138-139 , pp. 522
    • Teghil, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.