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Volumn 514-516, Issue PART 2, 2006, Pages 1161-1165
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Effect of processing conditions on the microstructure and electrical resistance of nanocrystalline ITO thin films made by laser ablation
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Author keywords
Electrical resistance; ITO; Laser ablation; Porosity; Thin films
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Indexed keywords
ELECTRIC RESISTANCE;
GROWTH RATE;
INDIUM COMPOUNDS;
LASER ABLATION;
MICROSTRUCTURE;
NANOCRYSTALLINE MATERIALS;
POROSITY;
SCANNING ELECTRON MICROSCOPY;
X RAY DIFFRACTION;
AGGLOMERATES;
CERAMIC TARGET;
INDIUM TIN OXIDE (ITO);
THIN FILMS;
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EID: 34547703857
PISSN: 02555476
EISSN: 16629752
Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.514-516.1161 Document Type: Conference Paper |
Times cited : (3)
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References (15)
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