A dry single-step process for the manufacture of released MEMS structures

Journal of Micromechanics and Microengineering

Volumn 13, Issue 5, 2003, Pages 790-794

  Docker, P T ^a   Kinnell, P ^a   Ward, M C L ^a  

^a UNIVERSITY OF BIRMINGHAM   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROFLUORIC ACID; INDUCTIVELY COUPLED PLASMA; MICROELECTROMECHANICAL DEVICES; REACTIVE ION ETCHING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON ON INSULATOR TECHNOLOGY; SILICON WAFERS;

DEEP REACTIVE ION ETCHING; NOTCHING PHENOMENA;

SEMICONDUCTOR DEVICE STRUCTURES;

EID: 0141495411     PISSN: 09601317     EISSN: None     Source Type: Journal    
DOI: 10.1088/0960-1317/13/5/335     Document Type: Article

References (10)

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