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Volumn 18, Issue 10, 2007, Pages 1051-1056
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Effect of substrate on hydrogen in and out diffusion from a-Si:H thin films
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Author keywords
[No Author keywords available]
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Indexed keywords
HYDROGEN EVOLUTION MEASUREMENT;
HYDROGEN PLASMA;
RADIO FREQUENCY GLOW DISCHARGE REACTOR;
CRYSTAL MICROSTRUCTURE;
CRYSTALLINE MATERIALS;
DIFFUSION;
HYDROGEN;
SUBSTRATES;
THIN FILMS;
AMORPHOUS SILICON;
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EID: 34547608205
PISSN: 09574522
EISSN: 1573482X
Source Type: Journal
DOI: 10.1007/s10854-007-9123-x Document Type: Article |
Times cited : (7)
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References (17)
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