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Volumn 17, Issue 7, 2007, Pages 1220-1231

Effects of mold geometries and imprinted polymer resist thickness on ultrasonic nanoimprint lithography

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTATIONAL GEOMETRY; COMPUTER SIMULATION; TEMPERATURE DISTRIBUTION;

EID: 34547595558     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/7/002     Document Type: Article
Times cited : (25)

References (11)
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    • Chou S Y, Krauss P R and Renstrom P J 1995 Imprint of sub-25 nm vias and trenches in polymers Appl. Phys. Lett. 67 3114-6
    • (1995) Appl. Phys. Lett. , vol.67 , Issue.21 , pp. 3114-3116
    • Chou, S.Y.1    Krauss, P.R.2    Renstrom, P.J.3
  • 2
    • 2942558559 scopus 로고    scopus 로고
    • Recent progress in nanoimprint technology and its applications
    • Guo L J 2004 Recent progress in nanoimprint technology and its applications J. Phys. D: Appl. Phys. 37 R123-41
    • (2004) J. Phys. D: Appl. Phys. , vol.37 , Issue.11
    • Guo, L.J.1
  • 3
    • 34547593017 scopus 로고    scopus 로고
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  • 4
    • 33748547705 scopus 로고    scopus 로고
    • Ultrasonic nanoimprint lithography: A new approach to nanopatterning
    • Lin C-H and Chen R 2006 Ultrasonic nanoimprint lithography: a new approach to nanopatterning J. Microlith. Microfab. Microsyst. 5 011003
    • (2006) J. Microlith. Microfab. Microsyst. , vol.5 , Issue.1 , pp. 011003
    • Lin, C.-H.1    Chen, R.2
  • 5
    • 0035519113 scopus 로고    scopus 로고
    • Study of the resist deformation in nanoimprint lithography
    • Hirai Y et al 2001 Study of the resist deformation in nanoimprint lithography J. Vac. Sci. Technol. B 19 2811-5
    • (2001) J. Vac. Sci. Technol. , vol.19 , Issue.6 , pp. 2811-2815
    • Hirai, Y.1    Al, E.2
  • 6
    • 13244279801 scopus 로고    scopus 로고
    • Simulation and experimental study of polymer deformation in nanoimprint lithography
    • Hirai Y et al 2004 Simulation and experimental study of polymer deformation in nanoimprint lithography J. Vac. Sci. Technol. B 22 3288-93
    • (2004) J. Vac. Sci. Technol. , vol.22 , Issue.6 , pp. 3288-3293
    • Hirai, Y.1    Al, E.2
  • 7
    • 15344346362 scopus 로고    scopus 로고
    • Analysis of the nanoimprint lithography with a viscous model
    • Young W-B 2005 Analysis of the nanoimprint lithography with a viscous model Microelectron. Eng. 77 405-11
    • (2005) Microelectron. Eng. , vol.77 , Issue.3-4 , pp. 405-411
    • Young, W.-B.1
  • 8
    • 2442479009 scopus 로고    scopus 로고
    • Flow behavior at the embossing stage of nanoimprint lithography
    • Jeong J H et al 2002 Flow behavior at the embossing stage of nanoimprint lithography Fibers Polym. 3 113-9
    • (2002) Fibers Polym. , vol.3 , pp. 113-119
    • Jeong, J.H.1    Al, E.2
  • 9
    • 27944505464 scopus 로고    scopus 로고
    • Impact of polymer film thickness and cavity size on polymer flow during embossing: Toward process design rules for nanoimprint lithography
    • Rowland H D et al 2005 Impact of polymer film thickness and cavity size on polymer flow during embossing: toward process design rules for nanoimprint lithography J. Micromech. Microeng. 15 2414-25
    • (2005) J. Micromech. Microeng. , vol.15 , Issue.12 , pp. 2414-2425
    • Rowland, H.D.1    Al, E.2
  • 10
    • 0030146002 scopus 로고    scopus 로고
    • Estimates for process conditions during the ultrasonic welding of thermoplastics
    • Nonhof C J and Luiten G A 1996 Estimates for process conditions during the ultrasonic welding of thermoplastics Polym. Eng. Sci. 36 1177-83
    • (1996) Polym. Eng. Sci. , vol.36 , Issue.9 , pp. 1177-1183
    • Nonhof, C.J.1    Luiten, G.A.2
  • 11
    • 0024899536 scopus 로고
    • Ultrasonic welding of thermoplastics in the far-field
    • Benatar A and Cheng Z 1989 Ultrasonic welding of thermoplastics in the far-field Polym. Eng. Sci. 29 1699-704
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    • Benatar, A.1    Cheng, Z.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.