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Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 679-683

Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation

Author keywords

Low temperature deposition; Photocatalysis; Plasma activated reactive evaporation; Pulse magnetron sputtering; Reactive sputtering; Titanium dioxide

Indexed keywords

CONTACT ANGLE; ELECTRON BEAMS; MAGNETRON SPUTTERING; PHOTOCATALYSIS; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

EID: 33747396843     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2005.11.001     Document Type: Article
Times cited : (33)

References (17)
  • 9
    • 33747405481 scopus 로고    scopus 로고
    • Bartzsch H. Thesis, Fakultät für Naturwissenschaften, Otto-von-Guericke-Universität Magdeburg, 2000.
  • 14
    • 0000550480 scopus 로고
    • Hass G. Vacuum 2 4 (1952) 331
    • (1952) Vacuum , vol.2 , Issue.4 , pp. 331
    • Hass, G.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.