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Volumn 80, Issue 7 SPEC. ISS., 2006, Pages 679-683
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Deposition of photocatalytic TiO2 layers by pulse magnetron sputtering and by plasma-activated evaporation
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Author keywords
Low temperature deposition; Photocatalysis; Plasma activated reactive evaporation; Pulse magnetron sputtering; Reactive sputtering; Titanium dioxide
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Indexed keywords
CONTACT ANGLE;
ELECTRON BEAMS;
MAGNETRON SPUTTERING;
PHOTOCATALYSIS;
PHYSICAL VAPOR DEPOSITION;
THIN FILMS;
LOW-TEMPERATURE DEPOSITION;
PLASMA-ACTIVATED REACTIVE EVAPORATION;
PULSE MAGNETRON SPUTTERING;
REACTIVE SPUTTERING;
TITANIUM DIOXIDE;
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EID: 33747396843
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2005.11.001 Document Type: Article |
Times cited : (33)
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References (17)
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