HfO2 thin films prepared by ion beam assisted deposition

Surface and Coatings Technology

Volumn 169-170, Issue , 2003, Pages 528-531

  Mori, Takanori ^a   Fujiwara, Makoto ^b   Manory, Rafael R ^a   Shimizu, Ippei ^c   Tanaka, Takeo ^b   Miyake, Shoji ^a  

^a OSAKA UNIVERSITY   (Japan)

^b OSAKA SANGYO UNIVERSITY   (Japan)

^c Mitubishi Electronic Co Ltd   (Japan)

Author keywords

HfO2; Ion beam assisted deposition; Knoop microhardness; Thin film

Indexed keywords

HAFNIUM COMPOUNDS; ION BEAM ASSISTED DEPOSITION; MORPHOLOGY; OXYGEN; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

TRANSPORT RATIO (TR);

THIN FILMS;

COATING; DEPOSITION; ENERGY; FILM; SURFACE TREATMENT;

EID: 0038347318     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00189-0     Document Type: Article

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