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Volumn , Issue , 2006, Pages 89-92

Carrier backscattering characteristics of strained N-MOSFET featuring silicon-carbon source/drain regions

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; CARRIER MOBILITY; DRAIN CURRENT; SILICON CARBIDE; TRANSISTORS;

EID: 34447259495     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDER.2006.307645     Document Type: Conference Paper
Times cited : (10)

References (9)
  • 1
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    • Enhancing CMOS transistor performance using lattice-mismatched materials in source/drain regions
    • May
    • Y.-C. Yeo, "Enhancing CMOS transistor performance using lattice-mismatched materials in source/drain regions," Conf. Dig. ISTDM, pp. 264-265, May 2006.
    • (2006) Conf. Dig. ISTDM , pp. 264-265
    • Yeo, Y.-C.1
  • 2
    • 0034452586 scopus 로고    scopus 로고
    • Mechanical Stress Effect of Etch-Stop Nitride and its Impact on Deep Submicron Transistor Design
    • December
    • Shinya Ito et al., "Mechanical Stress Effect of Etch-Stop Nitride and its Impact on Deep Submicron Transistor Design," IEDM Tech. Dig., pp. 247-250, December 2000.
    • (2000) IEDM Tech. Dig , pp. 247-250
    • Ito, S.1
  • 3
    • 3242671509 scopus 로고    scopus 로고
    • A 90nm High Volume Manufacturing Logic Technology Featuring Novel 45nm Gate Length Strained Silicon CMOS Transistors
    • December
    • T. Ghani et al., "A 90nm High Volume Manufacturing Logic Technology Featuring Novel 45nm Gate Length Strained Silicon CMOS Transistors," IEDM Tech. Dig., pp. 978-980, December 2003.
    • (2003) IEDM Tech. Dig , pp. 978-980
    • Ghani, T.1
  • 4
    • 33646073466 scopus 로고    scopus 로고
    • Dual Stress Liner Enhancement in Hybrid Orientation Technology
    • June
    • C.D. Sheraw et al., "Dual Stress Liner Enhancement in Hybrid Orientation Technology," Symp. VLSI Tech., pp. 12-13, June 2005.
    • (2005) Symp. VLSI Tech , pp. 12-13
    • Sheraw, C.D.1
  • 5
    • 33847755083 scopus 로고    scopus 로고
    • Thin Body Silicon-on-Insulator N-MOSFET with Silicon-Carbon Source/Drain Regions for Performance Enhancement
    • December
    • Kah-Wee Ang et al., "Thin Body Silicon-on-Insulator N-MOSFET with Silicon-Carbon Source/Drain Regions for Performance Enhancement," IEDMTech. Dig., pp. 503-506, December 2005.
    • (2005) IEDMTech. Dig , pp. 503-506
    • Ang, K.-W.1
  • 6
    • 0031191310 scopus 로고    scopus 로고
    • Elementary Scattering Theory of the Si MOSFET
    • July
    • Mark Lundstrom, "Elementary Scattering Theory of the Si MOSFET," IEEE Elect. Dev. Lett., vol. 18, pp. 361-363, July 1997.
    • (1997) IEEE Elect. Dev. Lett , vol.18 , pp. 361-363
    • Lundstrom, M.1
  • 7
    • 0036930453 scopus 로고    scopus 로고
    • Temperature Dependent Channel Backscattering Coefficients in Nanoscale MOSFETs
    • December
    • M.-J. Chen et al., "Temperature Dependent Channel Backscattering Coefficients in Nanoscale MOSFETs," IEDM Tech. Dig., pp. 39-42, December 2002.
    • (2002) IEDM Tech. Dig , pp. 39-42
    • Chen, M.-J.1
  • 8
    • 0033352176 scopus 로고    scopus 로고
    • Performance Limits of Silicon MOSFETs
    • December
    • F. Assad et al., "Performance Limits of Silicon MOSFETs," IEDM Tech. Dig., pp. 547-550, December 1999.
    • (1999) IEDM Tech. Dig , pp. 547-550
    • Assad, F.1
  • 9
    • 0035364878 scopus 로고    scopus 로고
    • On the Mobility Versus Drain Current Relation for a Nanoscale MOSFET
    • June
    • Mark S. Lundstrom, "On the Mobility Versus Drain Current Relation for a Nanoscale MOSFET," IEEE Elect. Dev. Lett., vol. 22, pp. 293-295, June 2001.
    • (2001) IEEE Elect. Dev. Lett , vol.22 , pp. 293-295
    • Lundstrom, M.S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.