Comparison of platelet formation in hydrogen and helium-implanted silicon

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 262, Issue 1, 2007, Pages 24-28

  Hebras, X ^a   Nguyen, P ^a   Bourdelle, K K ^a   Letertre, F ^a   Cherkashin, N ^b   Claverie, A ^b  

^a PARC TECHNOLOGIQUE DES FONTAINES   (France)

^b CEMES CNRS   (France)

Author keywords

Defects; Helium; Hydrogen; Implantation; Platelets

Indexed keywords

ANNEALING; HELIUM; HYDROGEN; ION IMPLANTATION; PLATELETS; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

CRYSTALLOGRAPHIC VARIANTS; HELIUM IMPLANTATION; PLATELET FORMATION; PLATELET POPULATION;

CRYSTAL DEFECTS;

EID: 34447105477     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.04.158     Document Type: Article

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