Synthesis of Si-Ge nanoscale structures via deposition of single-source (GeH 3) 4-nSiH n hydrides

Applied Physics Letters

Volumn 87, Issue 8, 2005, Pages

  Hu, Changwu ^a   Tsong, I S T ^a   D'Costa, V ^a   Menndez J ^a   Crozier, P A ^a   Tolle, J ^a   Kouvetakis, J ^a  

^a ARIZONA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECT-FREE MICROSTRUCTURES; FILM FORMATION; LOW-ENERGY ELECTRON; SINGLE-SOURCE HYDRIDES;

CONCENTRATION (PROCESS); GERMANIUM; HYDRIDES; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SEMICONDUCTOR QUANTUM DOTS;

SILICON;

EID: 34250656178     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2011792     Document Type: Article

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