Room temperature deposition of amorphous TiO2 film by pulsed bias arc ion plating

Jinshu Xuebao/Acta Metallurgica Sinica

Volumn 43, Issue 5, 2007, Pages 509-514

  Zhang, Min ^a   Lin, Guoqiang ^a   Dong, Chuang ^a   Wen, Lishi ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Amorphous TiO2 film; Arc ion plating; Optical property; Pulsed negative bias

Indexed keywords

AMORPHOUS MATERIALS; DEPOSITION; DEPOSITION RATES; FILMS; IRON PLATING; OPTICAL PROPERTIES; SURFACE MORPHOLOGY;

AMORPHOUS TITANIUM DIOXIDE FILM; ARC ION PLATING; PULSED NEGATIVE BIAS;

TITANIUM DIOXIDE;

EID: 34250333063     PISSN: 04121961     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (23)

1. Qu X X. Film Physics. Beijing: Publishing House of Electronics Industry, 1994: 237
2. Demaray R E, Zhang H M, Narasimhan M, Milonopoulou V. US Pat, 20040259305 A1, 2004
3. Liu J X, Yang D Z, Shi F. Thin Solid Films, 2003; 429: 225
4. Zhao K, Zhu F, Wang L F, Meng T J, Zhang B C, Zhao K. Acta Phys Sin, 2001; 50: 1390
5. Suda Y, Kawasaki H, Ueda T, Ohshima T. Thin Solid Films, 2005; 475: 337
6. Zhang F, Zheng Z H, Liu X H. Chin J Mater Res, 1992; 13: 581
7. Zhao Z W, Tay B K, Lau S P, Yu G Q. J Cryst Growth, 2004; 268: 543
8. Shi J R, Lau S P, Sun Z, Shi X, Tay B K, Tan H S. Surf Coat Technol, 2001; 138: 250
9. Bendavid A, Martin P J, Takikawa H. Thin Solid Films, 2000; 360: 241
10. Yan P X, Li X C, Li C, Li X, Xu J W. Chin J Nonferrous Met, 2005; 15: 987
11. Takikawa H, Matsui T, Sakakibara T, Bendavid A, Martin P J. Thin Solid Films, 1999; 348: 145
12. Lin G Q, Zhao Y H, Guo H M, Wang D Z, Dong C. J Vac Sci Technol, 2004; 22A: 1218
13. Huang M D, Lee Y P, Dong C, Lin G Q, Sun C, Wen L S. J Vac Sci Technol, 2004; 22A: 250
14. Theiss W. In: Theiss M, ed., Scout Thin Film Analysis Software Handbook, Aachen, Germany: Hard-and Software, 2005: 189
15. Okimura K. Surf Coat Technol, 2001; 135: 286
16. Vyskocil J, Musil J. J Vac Sci Technol, 1992; 10A: 1740
17. Yamada Y, Uyama H, Murata R, Nozoye H. J Vac Sci Technol, 2001; 19A: 2479
18. Nakamura M, Kato S, Aoki T, Sirghi L, Hatanaka Y. Thin Solid Films, 2001; 401: 138
19. Suhail M H, Mohan Rao G, Mohan S. J Appl Phys, 1992; 71: 1421
20. Amor S B, Rao G M, Mohan S. Thin Solid Films, 1997; 293: 163
21. Zhang Y, Jiang Z, Yu Z. J Opt Soc Am, 1988; A5: 1601
22. Meng L, Andritschky M, dos Santos M P. Thin Solid Films, 1993; 223: 242
23. Tauc J. Phys Solid State, 1966; 15: 627