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Volumn 682, Issue , 2001, Pages 144-149

Investigation of mechanical stresses in underlying silicon due to lead-tin solder bumps via synchrotron X-ray topography and finite element analysis

Author keywords

[No Author keywords available]

Indexed keywords

BALL GRID ARRAYS; FINITE ELEMENT METHOD; FLIP CHIP DEVICES; LEAD; SILICON; STRESS ANALYSIS; SYNCHROTRON RADIATION; TIN; X RAYS;

EID: 34249905614     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-682-n5.7     Document Type: Conference Paper
Times cited : (1)

References (15)
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  • 5
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    • Three-Dimensional Versus Two-Dimensional Finite Element Modeling of Flip-Chip Packages
    • Q. Yao and J. Qu, Three-Dimensional Versus Two-Dimensional Finite Element Modeling of Flip-Chip Packages, Transactions of the ASME, Journal of Electronic Packaging 121, pp. 196-201 (1999).
    • (1999) Transactions of the ASME, Journal of Electronic Packaging , vol.121 , pp. 196-201
    • Yao, Q.1    Qu, J.2
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    • Use of Synchrotron Radiation in X-ray Diffraction Topography
    • T. Tuomi, K. Naukkarinen and P. Rabe, Use of Synchrotron Radiation in X-ray Diffraction Topography, Phys. Stat. Sol. A 25,pp.93-106 (1974).
    • (1974) Phys. Stat. Sol. A , vol.25 , pp. 93-106
    • Tuomi, T.1    Naukkarinen, K.2    Rabe, P.3
  • 9
    • 4243732586 scopus 로고    scopus 로고
    • Sci Thesis, Optoelectronics Laboratory, Department of Electrical and Communications Engineering, Helsinki University of Technology, pp
    • R. Rantamaki, X-ray Topography of Semiconductors using Synchrotron Radiation, HD. Sci Thesis, Optoelectronics Laboratory, Department of Electrical and Communications Engineering, Helsinki University of Technology, pp. 11-12 (1999).
    • (1999) X-ray Topography of Semiconductors using Synchrotron Radiation, HD , pp. 11-12
    • Rantamaki, R.1
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    • X-ray Extinction Contrast Topography of Silicon Strained by Thin Surface Films
    • E.S. Meieran and I.A. Blech, X-ray Extinction Contrast Topography of Silicon Strained by Thin Surface Films, Journal of Applied Physics 36, pp.3162-3167 (1965).
    • (1965) Journal of Applied Physics , vol.36 , pp. 3162-3167
    • Meieran, E.S.1    Blech, I.A.2
  • 12
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    • M. Karilahti, T. Tuomi, M. Taskinen, J. Tulkki, H. Lipsanen and P. McNally, Synchrotron X-ray
    • M. Karilahti, T. Tuomi, M. Taskinen, J. Tulkki, H. Lipsanen and P. McNally, Synchrotron X-ray
  • 13
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    • Topographic Study of Strain in Silicon Wafers with Intergrated Circuits
    • Topographic Study of Strain in Silicon Wafers with Intergrated Circuits, IL Nuovo Cimento, 19D(2-4), pp. 181-184 (1997).
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