Synchrotron X-ray topographic study of strain in silicon wafers with integrated circuits

Nuovo Cimento della Societa Italiana di Fisica D - Condensed Matter, Atomic, Molecular and Chemical Physics, Biophysics

Volumn 19, Issue 2-4, 1997, Pages 181-184

  Karilahti, M ^a   Tuomi, T ^a   Taskinen, M ^a   Tulkki, J ^a   Llpsanenk, H ^a   McNally, P ^a  

^a AALTO UNIVERSITY   (Finland)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33749433240     PISSN: 03926737     EISSN: None     Source Type: Journal    
DOI: 10.1007/BF03040971     Document Type: Article

References (4)

1. TuoMi T., TUOMINEN M., PRIEUR E., PARTANEN J., LAHTINEN J. and LAAKKONEN J., J. Electrochem. Soc., 142 (1995) 1699.
2. PAUTANEN J., TUOMI T., YANG D. Y., LEE H.-G., KIM 0. H. and HAHN S., J. Electrochem, Soc., 139 (1993) 1431
3. MEIERAN E. S. and BLECH I. A., J. Appl. Phys., 43 (1972) 265.
4. STIFFLER S. R., J. Appl. Phys., 68 (1990) 351.