RHEED studies during growth of TiN/SiNx/TiN trilayers on MgO(0 0 1)

Surface Science

Volumn 601, Issue 11, 2007, Pages 2352-2356

  Söderberg, Hans ^a   Birch, Jens ^b   Hultman, Lars ^b   Odén, Magnus ^a  

^a LULEÅ UNIVERSITY OF TECHNOLOGY   (Sweden)

^b LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Epitaxy; In situ characterization; Phase transition; Physical vapor deposition; Reflection high energy electron diffraction (RHEED); Silicon nitride; Surface relaxation and reconstructions; Titanium nitride

Indexed keywords

DEPOSITION; EPITAXIAL GROWTH; MAGNESIUM COMPOUNDS; MAGNETRON SPUTTERING; PHASE TRANSITIONS; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; ULTRAHIGH VACUUM;

REACTIVE MAGNETRON SPUTTERING; SURFACE RECONSTRUCTIONS; SURFACE RELAXATION AND RECONSTRUCTIONS; TRILAYERS;

TITANIUM COMPOUNDS;

EID: 34249294534     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2007.04.001     Document Type: Article

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