Effect of temperature on structural and morphologic properties of ZnO films annealed in ammonia ambient

Journal of Electronic Materials

Volumn 36, Issue 4, 2007, Pages 502-506

  Xue, Shoubin ^a   Zhuang, Huizhao ^a   Xue, Chengshan ^a   Hu, Lijun ^a   Li, Baoli ^a   Zhang, Shiying ^a  

^a SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

Anneal; NH 3 ambient; Pulsed laser deposition (PLD); ZnO films

Indexed keywords

AMMONIA AMBIENT; CRYSTAL QUALITY;

AMMONIA; ANNEALING; FILM PREPARATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MORPHOLOGY; PULSED LASER DEPOSITION; THERMAL EFFECTS; X RAY DIFFRACTION; ZINC OXIDE;

THIN FILMS;

EID: 34249086959     PISSN: 03615235     EISSN: None     Source Type: Journal    
DOI: 10.1007/s11664-006-0042-z     Document Type: Conference Paper

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