Integration of functional epitaxial oxides into silicon: from high-k application to nanostructures

Microelectronic Engineering

Volumn 84, Issue 9-10, 2007, Pages 2222-2225

  Osten, H J ^a   Czernohorsky, M ^a   Dargis, R ^a   Laha, A ^a   Kuhne D ^a   Bugiel, E ^a   Fissel, A ^a  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

Author keywords

Gadolinium oxide; Heterostructures; High k material; Molecular beam epitaxy

Indexed keywords

GADOLINIUM COMPOUNDS; HETEROJUNCTIONS; MOLECULAR BEAM EPITAXY; MOS DEVICES; SEMICONDUCTOR QUANTUM WELLS; VAPOR PHASE EPITAXY;

GADOLINIUM OXIDE; HIGH-K MATERIAL;

CRYSTALLINE MATERIALS;

EID: 34248630820     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.04.092     Document Type: Article

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