Dependence of conduction type of ZnO films prepared by sputtering a Zn3As2/ZnO target on substrate temperature and thermal treatment

Journal of Crystal Growth

Volumn 304, Issue 2, 2007, Pages 295-298

  Fan, J C ^a   Xie, Z ^a   Wan, Q ^a   Wang, Y G ^a  

^a HUNAN UNIVERSITY   (China)

Author keywords

A1. Arsenic dopant; A1. Thermal treatment; A3. Zn3As2 ZnO target; B1. p Type ZnO films

Indexed keywords

DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; HEAT TREATMENT; MAGNETRON SPUTTERING; SUBSTRATES; ZINC OXIDE;

ARSENIC DOPANT; GLASS SUBSTRATES; SUBSTRATE TEMPERATURE; ZNO FILMS;

THIN FILMS;

EID: 34248576522     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.02.027     Document Type: Article

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