Atomic modeling of the plasma EUV sources

High Energy Density Physics

Volumn 3, Issue 1-2, 2007, Pages 250-255

  Sasaki, Akira ^a   Sunahara, Atsushi ^b   Nishihara, Katsunobu ^c   Nishikawa, Takeshi ^d   Fujima, Kazumi ^e   Kagawa, Takashi ^f   Koike, Fumihiro ^g   Tanuma, Hajime ^h  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b INSTITUTE FOR LASER TECHNOLOGY   (Japan)

^c OSAKA UNIVERSITY   (Japan)

^d OKAYAMA UNIVERSITY   (Japan)

^e UNIVERSITY OF YAMANASHI   (Japan)

^f NARA WOMEN'S UNIVERSITY   (Japan)

^g KITASATO UNIVERSITY   (Japan)

^h TOKYO METROPOLITAN UNIVERSITY   (Japan)

Author keywords

Collisional radiative model; EUV lithography; Laser produced plasma; Opacity; Plasma spectroscopy

Indexed keywords

EID: 34248570328     PISSN: 15741818     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.hedp.2007.02.031     Document Type: Article

References (16)

1. U. Stamm, J. KIleinschmidt, D. Bolshukhin, J. Brudermann, G. Hergenhan, V. Korobotchko, B. Nikolaus, M.C. Scürmann, G. Schriever, C. Ziener, V.M. Borisov, Proceedings of SPIE, Emerging Lithographic Technologies X, vol. 6151, 61500O-1, 2006.
2. B.A.M. Hansson, I.V. Fomenkov, N.R. Böwering, A.I. Erashov, W.N. Partlo, D.W. Myers, O.V. Khodykin, A.N. Bykanov, C.L. Rettig, J.R. Hoffman, E. Vargas, R.D. Simmons, J.A. Chavez, W.F. Marx, D.C. Brandt, Proceedings of SPIE, Emerging Lithographic Technologies X, vol. 6151, 61500R-1, 2006.
3. Takenoshita K., Koay C.S., Teerawattansook S., and Richardson M. Proc. SPIE 5751 (2005) 563-571
4. Kawamura T., Sunahara A., Gamada K., Fujima K., Koike F., Furukawa H., Nishikawa T., Sasaki A., Kagawa T., More R., Kato T., Murakami M., Zhakhovskii V.V., Tanuma H., Fujimoto T., Shimada Y., Yamaura M., Hashimoto K., Uchida S., Yamanaka C., Okuno T., Hibino T., Ueda N., Matsui R., Tao Y., Nakai M., Shigemori K., Fujioka S., Nagai K., Norimatsu T., Nishimura H., Nishihara K., Miyanaga N., and Izawa Y. Proc. SPIE 5374 (2006) 918-925
5. Svendsen W., and O'Sullivan G. Phys. Rev. A50 (1994) 3710
6. Sasaki A., Nishihara K., Murakami M., Koike F., Kagawa T., Nishikawa T., Fujima K., Kawamura T., and Furukawa H. Appl. Phys. Lett. 85 (2004) 5857
7. Nishihara K., Sasaki A., Nishikawa T., and Sunahara A. In: Baksi V. (Ed). EUV Sources for Lithography (2006), SPIE press 339-371
8. Poirier M., Blenski T., Dortan F.G., and Gilleron F. J. Quant. Spectrosc. Radiat. Transfer 99 (2006) 482
9. Kieft E.R., Garloff K., Mullen J.J.A.M., and Banine V. Phys. Rev. E71 (2005) 036402
10. Sasaki A., Nishihara K., Koike F., Kagawa T., Nishikawa T., Fujima K., Kawamura T., and Furukawa H. IEEE J. Sel. Top. Quantum Electron 10 (2004) 1307
11. Bar-Shalom A., Oreg J., and Klapisch M. Phys. Rev. E56 (1997) R70
12. W.A. Lokke, W.H. Grasberger, Lawrence Livermore Laboratory Report No. UCRL-52276 (unpublished).
13. Bauche-Arnoult C., Bauche J., and Klapisch M. Phys. Rev. A31 (1985) 2248
14. K. Nishihara, paper presented at international EUVL symposium, 2006.
15. Tanuma H., Ohashi H., Shibuya E., Kobayashi N., Okuno T., Fujioka S., Nishimura H., and Nishihara K. Nucl. Instrum. Methods. Phys. Res. Sect. B 235 (2005) 331
16. Dortan F.G. J. Phys. B, At. Mol Opt. Phys. 40 (2007) 599