Radiative properties of patterned wafers with nanoscale linewidth

Journal of Heat Transfer

Volumn 129, Issue 1, 2007, Pages 79-90

  Chen, Y B ^a   Zhang, Z M ^a   Timans, P J ^b  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b MATTSON THERMAL PRODUCTS GMBH   (United States)

Author keywords

Electromagnetic; Microstructure; Nanoscale; Properties; Radiation

Indexed keywords

HEAT RADIATION; HEATING; HOMOGENIZATION METHOD; MAXWELL EQUATIONS; SEMICONDUCTOR DOPING; TEMPERATURE DISTRIBUTION; THERMAL DIFFUSION; THERMAL EFFECTS; THERMAL STRESS;

FLASH-LAMP RADIATION; PATTERNED WAFERS; SPECTRAL DISTRIBUTION;

RAPID THERMAL PROCESSING;

HEAT RADIATION; HEATING; HOMOGENIZATION METHOD; MAXWELL EQUATIONS; RAPID THERMAL PROCESSING; SEMICONDUCTOR DOPING; TEMPERATURE DISTRIBUTION; THERMAL DIFFUSION; THERMAL EFFECTS; THERMAL STRESS;

EID: 34248379174     PISSN: 00221481     EISSN: None     Source Type: Journal    
DOI: 10.1115/1.2401201     Document Type: Article

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