Evaluating the effects of thin film patterns on the temperature distribution of silicon wafers during radiant processing

Optical Engineering

Volumn 39, Issue 8, 2000, Pages 2296-2304

  Tada, Haruna ^a   Abramson, Alexis R ^a   Mann, Seth E ^a   Miaoulis, Ioannis N ^a   Wong, Peter Y ^a  

^a TUFTS UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EFFECTS; LIGHT EMISSION; NUMERICAL METHODS; RADIANT HEATING; TEMPERATURE DISTRIBUTION; THIN FILMS; TRANSPARENCY;

PARTIAL TRANSPARENCY; RADIATIVE PROPERTIES;

SILICON WAFERS;

EID: 0034249577     PISSN: 00913286     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1305525     Document Type: Article

References (8)

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3. A. R. Abramson, P. Nieva, H. Tada, P. Zavracky, I. N. Miaoulis, and P. Y. Wong, "Effect of doping level during rapid thermal processing of multilayer structures," J. Mater. Res. 14(6), 2402-2410 (1999).
4. F. P. Incropera and D. P. DeWitt, Introduction to Heat Transfer, 2nd ed., John Wiley & Sons, New York (1990).
5. O. S. Heavens, Optical Properties of Thin Solid Films, pp. 46-95, Butterworth, Washington, D.C. (1955).
6. P. Y. Wong, "Processing uniformity in thin-film manufacturing by thermal radiative heating," PhD Dissertation, Tufts University (1995).
7. H. Tada, A. R. Abramson, I. N. Miaoulis, P. Y. Wong, P. Nieva, and P. Zavracky, "Effects of surface patterning in thin film structures on the thermal radiative properties during rapid thermal processing," in Proc. 1998 ASME Int. Mechanical Engineering Congr. and Exposition, HTD 361-2, pp. 93-98 (1998).
8. H. Tada, I. N. Miaoulis, and P. Y. Wong, "Numerical simulation of radiant thermal processing of bilayer microcantilevers," in Proc. 1998 ASME Int. Mechanical Engineering Congr. and Exposition, DSC-Vol. 66, pp. 37-44 (1998).