-
1
-
-
0036544447
-
A model explaining mask-corner undercut phenomena in anisotropic silicon etching: A saddle point in the etching-rate diagram
-
Shikida M, Nanbara K, Koizumi T, Sasaki H, Odagaki M, Sato K, Ando M, Furuta S, Asaumi K. A model explaining mask-corner undercut phenomena in anisotropic silicon etching: a saddle point in the etching-rate diagram. Sensors and Actuators A 2002; 97-98(1):758-763.
-
(2002)
Sensors and Actuators A
, vol.97-98
, Issue.1
, pp. 758-763
-
-
Shikida, M.1
Nanbara, K.2
Koizumi, T.3
Sasaki, H.4
Odagaki, M.5
Sato, K.6
Ando, M.7
Furuta, S.8
Asaumi, K.9
-
2
-
-
0025521074
-
Anisotropic etching of crystalline silicon in alkaline solutions
-
Seidel H, Csepregi L, Heuberger A, Baumgärtel H. Anisotropic etching of crystalline silicon in alkaline solutions. Journal of the Electrochemical Society 1990; 137(11):3612-3625.
-
(1990)
Journal of the Electrochemical Society
, vol.137
, Issue.11
, pp. 3612-3625
-
-
Seidel, H.1
Csepregi, L.2
Heuberger, A.3
Baumgärtel, H.4
-
3
-
-
0002714214
-
The mechanism of anisotropic silicon etching and its relevance for micromachining
-
Tokyo, Japan;
-
Seidel H. The mechanism of anisotropic silicon etching and its relevance for micromachining, Technical Digest of Transducers '87, Tokyo, Japan; 1987; 120-125.
-
(1987)
Technical Digest of Transducers '87
, pp. 120-125
-
-
Seidel, H.1
-
6
-
-
0037871729
-
Side-opened out-of-plane microneedles for microfluidic transdermal liquid transfer
-
Griss P, Stemme G. Side-opened out-of-plane microneedles for microfluidic transdermal liquid transfer. Journal of Microelectromechanical Systems 2003; 12:296-301.
-
(2003)
Journal of Microelectromechanical Systems
, vol.12
, pp. 296-301
-
-
Griss, P.1
Stemme, G.2
-
9
-
-
1242271084
-
Transdermal delivery of insulin using microneedles in vivo
-
Glasgow, UK;
-
Martanto W, Davis S, Holiday N, Wang J, Gill H, Prausnitz M. Transdermal delivery of insulin using microneedles in vivo, Proceedings of International Symposium on Controlled Release Bioactive Material, no. 666, Glasgow, UK; 2003.
-
(2003)
Proceedings of International Symposium on Controlled Release Bioactive Material
, vol.666
-
-
Martanto, W.1
Davis, S.2
Holiday, N.3
Wang, J.4
Gill, H.5
Prausnitz, M.6
-
10
-
-
2942716734
-
Insertion of microneedles into skin: Measurement and prediction of insertion force and needle fracture force
-
Davis SP, Landis BJ, Adams ZH, Allen MG, Prausnitz MR. Insertion of microneedles into skin: measurement and prediction of insertion force and needle fracture force. Journal of Biomechanics 2004; 37(8):1155-1163.
-
(2004)
Journal of Biomechanics
, vol.37
, Issue.8
, pp. 1155-1163
-
-
Davis, S.P.1
Landis, B.J.2
Adams, Z.H.3
Allen, M.G.4
Prausnitz, M.R.5
-
11
-
-
0027845301
-
An ion milling pattern transfer technique for fabrication of three-dimensional micromechanical structures
-
Dizon R, Han H, Russell AG, Reed ML. An ion milling pattern transfer technique for fabrication of three-dimensional micromechanical structures. Journal of Microelectromechanical Systems 1993; 2(4):151-159.
-
(1993)
Journal of Microelectromechanical Systems
, vol.2
, Issue.4
, pp. 151-159
-
-
Dizon, R.1
Han, H.2
Russell, A.G.3
Reed, M.L.4
-
13
-
-
0000110947
-
Comparative studies of TMAH and KOH for anisotropic etching of silicon
-
Zavracky PM. Comparative studies of TMAH and KOH for anisotropic etching of silicon. The Electrochemical Society Proceedings 1997; 97-5:102-117.
-
(1997)
The Electrochemical Society Proceedings
, vol.97 -5
, pp. 102-117
-
-
Zavracky, P.M.1
-
14
-
-
0000818529
-
Compensating corner undercutting of (100) silicon in KOH
-
Offereins HL, Sandmaier H, Marusczyk K, Kühl K, Plettner A. Compensating corner undercutting of (100) silicon in KOH. Sensors and Materials 1992; 3(3):127-144.
-
(1992)
Sensors and Materials
, vol.3
, Issue.3
, pp. 127-144
-
-
Offereins, H.L.1
Sandmaier, H.2
Marusczyk, K.3
Kühl, K.4
Plettner, A.5
-
15
-
-
0025537261
-
Fabrication of non-underetched convex corners in anisotropic etching of (100)-silicon in aqueous KOH with respect to novel micromechanic elements
-
Mayer GK, Offereins HL, Sandmaier H, Kühl K. Fabrication of non-underetched convex corners in anisotropic etching of (100)-silicon in aqueous KOH with respect to novel micromechanic elements. Journal of Electrochemical 1990; 137(12):3947-3951.
-
(1990)
Journal of Electrochemical
, vol.137
, Issue.12
, pp. 3947-3951
-
-
Mayer, G.K.1
Offereins, H.L.2
Sandmaier, H.3
Kühl, K.4
-
16
-
-
0025497671
-
Methods for the fabrication of convex corners in anisotropic etching of (100) silicon in aqueous KOH
-
Offereins HL, Kühl K, Sandmaier H. Methods for the fabrication of convex corners in anisotropic etching of (100) silicon in aqueous KOH. Sensors and Actuators A 1991; 25-27: 9-13.
-
(1991)
Sensors and Actuators A
, vol.25-27
, pp. 9-13
-
-
Offereins, H.L.1
Kühl, K.2
Sandmaier, H.3
-
17
-
-
0031700033
-
Characterization of orientation-dependent etching properties of single-crystal silicon: Effects of KOH concentration
-
Sato K, Shikida M, Matsushima Y, Yamashiro T, Asaumi K, Iriye Y, Yamamoto M. Characterization of orientation-dependent etching properties of single-crystal silicon: effects of KOH concentration. Sensors and Actuators A 1998; 64: 87-93.
-
(1998)
Sensors and Actuators A
, vol.64
, pp. 87-93
-
-
Sato, K.1
Shikida, M.2
Matsushima, Y.3
Yamashiro, T.4
Asaumi, K.5
Iriye, Y.6
Yamamoto, M.7
-
18
-
-
0033537540
-
Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation
-
Sato K, Shikida M, Yamashiro T, Asaumi K, Iriye Y, Yamamoto M. Anisotropic etching rates of single-crystal silicon for TMAH water solution as a function of crystallographic orientation. Sensors and Actuators A 1999; 73:131-137.
-
(1999)
Sensors and Actuators A
, vol.73
, pp. 131-137
-
-
Sato, K.1
Shikida, M.2
Yamashiro, T.3
Asaumi, K.4
Iriye, Y.5
Yamamoto, M.6
-
19
-
-
0030145363
-
Surface morphology of p-type (100) silicon etched in aqueous alkaline solution
-
Bressers PMMC, Kelly JJ, Gardeniers JGE, Elwenspoek M. Surface morphology of p-type (100) silicon etched in aqueous alkaline solution. Journal of the Electrochemical Society 1996; 143(5):1744-1750.
-
(1996)
Journal of the Electrochemical Society
, vol.143
, Issue.5
, pp. 1744-1750
-
-
Bressers, P.M.M.C.1
Kelly, J.J.2
Gardeniers, J.G.E.3
Elwenspoek, M.4
-
20
-
-
0031355251
-
AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si (100) in KOH for micromachining applications
-
Baum T, Schiffrin DJ. AFM study of surface finish improvement by ultrasound in the anisotropic etching of Si (100) in KOH for micromachining applications. Journal of Micromechanics and Microengineering 1997; 7:338-342.
-
(1997)
Journal of Micromechanics and Microengineering
, vol.7
, pp. 338-342
-
-
Baum, T.1
Schiffrin, D.J.2
-
21
-
-
0032665972
-
Roughening and smoothing dynamics during KOH silicon etching
-
Divan R, Moldovan N, Camon H. Roughening and smoothing dynamics during KOH silicon etching. Sensors and Actuators A 1999; 74:18-23.
-
(1999)
Sensors and Actuators A
, vol.74
, pp. 18-23
-
-
Divan, R.1
Moldovan, N.2
Camon, H.3
-
22
-
-
0343430171
-
Effects of small amount of impurities on etching of silicon in aqueous potassium hydroxide solutions
-
Sendai, Japan;
-
Tanaka H, Abe Y, Yoneyama T, Ishikawa J, Takenaka O. Effects of small amount of impurities on etching of silicon in aqueous potassium hydroxide solutions, Technical Digest of Transducers '99, Sendai, Japan; 1999; 538-541.
-
(1999)
Technical Digest of Transducers '99
, pp. 538-541
-
-
Tanaka, H.1
Abe, Y.2
Yoneyama, T.3
Ishikawa, J.4
Takenaka, O.5
-
23
-
-
0033537516
-
Roughening of single-crystal silicon: Surface etched by KOH water solution
-
Sato K, Shikida M, Yamashiro T, Tsunekawa M, Ito S. Roughening of single-crystal silicon: surface etched by KOH water solution. Sensors and Actuators A 1999; 73:122-130.
-
(1999)
Sensors and Actuators A
, vol.73
, pp. 122-130
-
-
Sato, K.1
Shikida, M.2
Yamashiro, T.3
Tsunekawa, M.4
Ito, S.5
-
24
-
-
0034498167
-
Surface morphology of anisotropically etched single-crystal silicon
-
Shikida M, Tokoro K, Uchikawa D, Sato K. Surface morphology of anisotropically etched single-crystal silicon. Journal of Micromechanics and Microengineering 2000; 10(4):522-527.
-
(2000)
Journal of Micromechanics and Microengineering
, vol.10
, Issue.4
, pp. 522-527
-
-
Shikida, M.1
Tokoro, K.2
Uchikawa, D.3
Sato, K.4
-
25
-
-
0001001968
-
Surface roughness of single-crystal silicon etched by TMAH solution
-
Shikida M, Masuda T, Uchikawa D, Sato K. Surface roughness of single-crystal silicon etched by TMAH solution. Sensors and Actuators A 2001; 90(3):223-231.
-
(2001)
Sensors and Actuators A
, vol.90
, Issue.3
, pp. 223-231
-
-
Shikida, M.1
Masuda, T.2
Uchikawa, D.3
Sato, K.4
|