-
1
-
-
19944418278
-
-
0167-9317 10.1016/j.mee.2005.04.056
-
R. Droopad, M. Passlack, N. England, K. Rajagopalan, J. Abrokwah, and A. Kummel, Microelectron. Eng. 0167-9317 10.1016/j.mee.2005.04.056 80, 138 (2005).
-
(2005)
Microelectron. Eng.
, vol.80
, pp. 138
-
-
Droopad, R.1
Passlack, M.2
England, N.3
Rajagopalan, K.4
Abrokwah, J.5
Kummel, A.6
-
2
-
-
0031208025
-
-
0022-0248 10.1016/S0022-0248(97)00135-8
-
K. S. Kim, J. -H. Kim, D. H. Lim, G. M. Yang, J. Y. Kim, and H. J. Lee, J. Cryst. Growth 0022-0248 10.1016/S0022-0248(97)00135-8 179, 427 (1997).
-
(1997)
J. Cryst. Growth
, vol.179
, pp. 427
-
-
Kim, K.S.1
Kim, J.-H.2
Lim, D.H.3
Yang, G.M.4
Kim, J.Y.5
Lee, H.J.6
-
3
-
-
0029734002
-
-
0022-0248 10.1016/0022-0248(95)00338-X
-
N. Y. Jin-Phillipp, F. Phillipp, T. Marschner, W. Stolz, and E. O. Gobel, J. Cryst. Growth 0022-0248 10.1016/0022-0248(95)00338-X 158, 28 (1996).
-
(1996)
J. Cryst. Growth
, vol.158
, pp. 28
-
-
Jin-Phillipp, N.Y.1
Phillipp, F.2
Marschner, T.3
Stolz, W.4
Gobel, E.O.5
-
4
-
-
0036610543
-
-
0741-3106 10.1109/LED.2002.1004215
-
K. Eisenbeiser, R. Emrick, R. Droopad, Z. Yu, J. Finder, S. Rockwell, J. Holmes, C. Overgaard, and W. Ooms, IEEE Electron Device Lett. 0741-3106 10.1109/LED.2002.1004215 23, 300 (2002).
-
(2002)
IEEE Electron Device Lett.
, vol.23
, pp. 300
-
-
Eisenbeiser, K.1
Emrick, R.2
Droopad, R.3
Yu, Z.4
Finder, J.5
Rockwell, S.6
Holmes, J.7
Overgaard, C.8
Ooms, W.9
-
6
-
-
0000059047
-
-
0003-6951 10.1063/1.121162
-
M. T. Currie, S. B. Samavedam, T. A. Langdo, C. W. Leitz, and E. A. Fitzgerald, Appl. Phys. Lett. 0003-6951 10.1063/1.121162 72, 1718 (1998).
-
(1998)
Appl. Phys. Lett.
, vol.72
, pp. 1718
-
-
Currie, M.T.1
Samavedam, S.B.2
Langdo, T.A.3
Leitz, C.W.4
Fitzgerald, E.A.5
-
7
-
-
0037704614
-
-
G. L. Luo, T. -H. Yang, E. Y. Chang, C. -Y. Chang, and K. -A. Chao, Jpn. J. Appl. Phys., Part 2 42, L517 (2003).
-
(2003)
Jpn. J. Appl. Phys., Part 2
, vol.42
, pp. 517
-
-
Luo, G.L.1
Yang, T.-H.2
Chang, E.Y.3
Chang, C.-Y.4
Chao, K.-A.5
-
9
-
-
33645669650
-
-
0021-8979 10.1063/1.2181267
-
J. T. Ku, M. C. Kuo, J. L. Shen, K. C. Chiu, T. H. Yang, G. L. Luo, C. Y. Chang, Y. C. Lin, C. P. Fu, D. S. Chuu, C. H. Chia, and W. C. Chou, J. Appl. Phys. 0021-8979 10.1063/1.2181267 99, 063506 (2006).
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 063506
-
-
Ku, J.T.1
Kuo, M.C.2
Shen, J.L.3
Chiu, K.C.4
Yang, T.H.5
Luo, G.L.6
Chang, C.Y.7
Lin, Y.C.8
Fu, C.P.9
Chuu, D.S.10
Chia, C.H.11
Chou, W.C.12
-
10
-
-
0034051420
-
-
0968-4328 10.1016/S0968-4328(99)00086-4
-
L. Lazzarini, L. Nasi, G. Salviati, C. Z. Fregonara, Y. Li, L. J. Giling, and D. B. Holt, Micron 0968-4328 10.1016/S0968-4328(99)00086-4 31, 217 (2000).
-
(2000)
Micron
, vol.31
, pp. 217
-
-
Lazzarini, L.1
Nasi, L.2
Salviati, G.3
Fregonara, C.Z.4
Li, Y.5
Giling, L.J.6
Holt, D.B.7
-
11
-
-
0030165093
-
-
0022-0248 10.1016/0022-0248(95)00958-2
-
Y. Li, G. Salviati, M. M. G. Bongers, L. Lazzarini, L. Nasi, and L. J. Giling, J. Cryst. Growth 0022-0248 10.1016/0022-0248(95)00958-2 163, 195 (1996).
-
(1996)
J. Cryst. Growth
, vol.163
, pp. 195
-
-
Li, Y.1
Salviati, G.2
Bongers, M.M.G.3
Lazzarini, L.4
Nasi, L.5
Giling, L.J.6
-
12
-
-
0035399283
-
-
0022-0248
-
W. Li, S. Laaksonen, J. Haapamaa, and M. Pessa, J. Cryst. Growth 227-228, 104 (2001). 0022-0248
-
(2001)
J. Cryst. Growth
, vol.227-228
, pp. 104
-
-
Li, W.1
Laaksonen, S.2
Haapamaa, J.3
Pessa, M.4
-
13
-
-
0032475634
-
-
0022-0248 10.1016/S0022-0248(98)00600-9
-
P. Modak, M. K. Hudait, S. Hardikar, and S. B. Krupanidhi, J. Cryst. Growth 0022-0248 10.1016/S0022-0248(98)00600-9 193, 501 (1998).
-
(1998)
J. Cryst. Growth
, vol.193
, pp. 501
-
-
Modak, P.1
Hudait, M.K.2
Hardikar, S.3
Krupanidhi, S.B.4
-
14
-
-
21544463767
-
-
0001-6160 10.1016/0001-6160(53)90106-0
-
P. Gay, P. B. Hirsh, and A. Kelly, Acta Metall. 0001-6160 10.1016/0001-6160(53)90106-0 1, 315 (1953).
-
(1953)
Acta Metall.
, vol.1
, pp. 315
-
-
Gay, P.1
Hirsh, P.B.2
Kelly, A.3
-
15
-
-
0023120312
-
-
R. D. Dupuis, J. C. Bean, J. M. Brown, A. T. Macrander, R. C. Miller, and L. C. Hopkins, J. Electron. Mater. 16, 69 (1987).
-
(1987)
J. Electron. Mater.
, vol.16
, pp. 69
-
-
Dupuis, R.D.1
Bean, J.C.2
Brown, J.M.3
MacRander, A.T.4
Miller, R.C.5
Hopkins, L.C.6
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