Step and flash imprint lithography template characterization, from an etch perspective

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 21, Issue 6, 2003, Pages 2771-2776

  Dauksher, W J ^a   Mancini, D P ^a   Nordquist, K J ^a   Resnick, D J ^a   Standfast, D L ^a   Convey, D ^a   Wei, Y ^a  

^a MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; ATOMIC FORCE MICROSCOPY; CARBON NANOTUBES; CHROMIUM; DRY ETCHING; INDUCTIVELY COUPLED PLASMA; ION BEAMS; MASKS; PERTURBATION TECHNIQUES; QUARTZ; SCANNING ELECTRON MICROSCOPY;

CRITICAL DIMENSIONS (CD); FOCUSED ION BEAMS (FIB); STEP AND FLASH IMPRINT LITHOGRAPHY (SFIL);

LITHOGRAPHY;

EID: 0942300049     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1629299     Document Type: Conference Paper

References (5)

1. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, M. Wedlake, T. Michaelson, S. V. Sreenivasan, J. Ekerdt, and C. G. Willson, Proc. SPIE 3676, 171 (1999).
2. T. C. Bailey, D. J. Resnick, D. Mancini, K. J. Nordquist, W. J. Dauksher, E. Ainley, A. Talin, K. Gehoski, J. H. Baker, B. J. Choi, S. Johnson, M. Colburn, M. Meissl, S. V. Sreenivasan, J. G. Ekerdt, and C. G. Willson, Microelectron. Eng. 61/62, 461 (2002).
3. D. P. Mancini, K. A. Gehoski, W. J. Dauksher, K. J. Nordquist, D. J. Resnick, P. Schumaker, and I. McMackin, Proc. SPIE 5037, 187 (2003).
4. W. J. Dauksher, D. J. Resnick, S. B. Clemens, D. L. Standfast, Z. S. Masnyj, J. R. Wasson, N. M. Bergmann, S.-I. Han, and P. J. S. Mangat, J. Vac. Sci. Technol. B 18, 3232 (2000).
5. K. H. Smith, J. R. Wasson, P. J. S. Mangat, W. J. Dauksher, and D. J. Resnick, J. Vac. Sci. Technol. B 19, 2906 (2001).