Fabrication of step and flash™ imprint lithography templates using commercial mask processes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5037 II, Issue , 2003, Pages 1019-1028

  Thompson, Ecron ^a   Rhyins, Peter ^b   Voisin, Ron ^a   Sreenivasan, S V ^a   Martin, Patrick ^b  

^a MOLECULAR IMPRINTS INC   (United States)

^b PHOTRONICS INC   (United States)

Author keywords

Imprint lithography using UV cured liquids; Phase mask processes; Step and flash imprint lithography; Template fabrication

Indexed keywords

MASKS; PHASE SHIFT; SILICON WAFERS; VISCOSITY;

ION PROJECTION LITHOGRAPHY; OPTICAL PROXIMITY CORRECTION; PHASE MASK PROCESSES; STEP AND FLASH IMPRINT LITHOGRAPHY; TEMPLATE FABRICATION;

LITHOGRAPHY;

EID: 0141724576     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.490141     Document Type: Conference Paper

References (4)

1. S.Y. Chou, P.R. Krauss, P.J. Renstrom, "Nanoimprint lithography," J. Vac. Sci., Tech. B, 1996, 14(6): p. 4129.
2. Mathew Colburn, Todd Bailey, Byung Jin Choi, John G. Ekerdt, S.V. Sreenivasan, C. Grant Willson, "Step and Flash Imprint Lithography," Solid State Technology, July 2001.
3. Resnick, D.J. et al., "High Resolution Templates for Step and Flash Imprint Lithography," SPIE MicroLithography Conference, February 2002.
4. Ian McMackin, Philip Schumaker, Ronald Voisin, "Design and Performance of a Step and Repeat Imprinting Machine," SPIE Microlithography Conference, February 2003.