Origin of LER and its solution

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5753, Issue I, 2005, Pages 390-399

  Lee, Geunsu ^a   Eom, Tae Seung ^a   Bok, Cheolkyu ^a   Lim, Changmoon ^a   Moon, Seung Chan ^a   Kim, Jinwoong ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

ArF Lithography; LER; LWR; Mask; Photoresist

Indexed keywords

HYDROPHOBICITY; LITHOGRAPHY; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; WETTING;

ARF LITHOGRAPHY; LINE EDGE ROUGHNESS (LER); LWR; MASK;

SURFACE ROUGHNESS;

EID: 24644504231     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599239     Document Type: Conference Paper

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