SCOPUS 정보 검색 플랫폼

Volumn 5753, Issue II, 2005, Pages 790-798

Studies on leaching of photoresist components by water

Author keywords

[No Author keywords available]

Indexed keywords

LEACHING; LENSES; NEGATIVE IONS; POLYMERS; QUENCHING; REFRACTIVE INDEX; WATER;

FREE VOLUME; IMMERSION LITHOGRAPHY; NUMERICAL APERTURE (NA); PHOTOACID GENERATOR (PAG);

PHOTORESISTS;

EID: 24644512765 PISSN: 16057422 EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.598618 Document Type: Conference Paper

Times cited : (5)

References (10)

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2
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4
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- Deogbae Kim, Hyun-Jin Kim, Sook-Hee Cho, Dong-Hwal Lee, Kwang-Hyi Im, Min-Ja Yoo, Sang-Hyang Lee, Jaehyun Kim, Jin-Soo Kim, and Hyung-Soo Kim, Proc. SPIE, 5039, 1086(2003)
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- Choi, Y.-J.¹ Kim, J.-W.² Kim, J.-Y.³ Yim, Y.-G.⁴ Kim, J.⁵ Jung, J.-C.⁶ Min, M.-J.⁷ Bok, C.-K.⁸ Shin, K.-S.⁹

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.