Study of the interface Si-nc/SiO2 by infrared spectroscopic ellipsometry and X-ray photoelectron spectroscopy

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 38, Issue 1-2, 2007, Pages 176-180

  Stenger, I ^a   Gallas, B ^a   Siozade, L ^a   Fisson, S ^a   Vuye, G ^a   Chenot, S ^a   Rivory, J ^a  

^a INSTITUT DES NANOSCIENCES DE PARIS   (France)

Author keywords

Interface; IR ellipsometry; Si nanoparticle; XPS

Indexed keywords

ELECTRON GUNS; ETCHING; EVAPORATION; INFRARED SPECTROSCOPY; INTERFACES (MATERIALS); PHASE SEPARATION; SPECTROSCOPIC ELLIPSOMETRY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ELECTRON-GUN EVAPORATION; THERMAL ANNEALING; TRANSVERSE OPTICAL (TO) VIBRATION MODE;

SILICA;

EID: 34147163443     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2006.12.032     Document Type: Article

References (23)

1. Hanaizumi O., Ono K., and Ogama Y. Appl. Phys. Lett. 82 (2003) 538
2. Gallas B., Kao C.-C., Fisson S., Vuye G., Rivory J., Bernard Y., and Belouet C. Appl. Surf. Sci. 185 (2002) 317
3. Tomozeiu N., van Faassen E.E., Arnoldbik W.M., Vredenberg A.M., and Habraken F.H.P.M. Thin Solid Films 420/421 (2002) 382
4. Torrison L., Tolle J., Smith D.J., Poweleit C., Menedez J., Mitan M.M., Alford T.L., and Kouvetakis J. J. Appl. Phys. 92 (2002) 7475
5. Bell F.G., and Ley L. Phys. Rev. B 37 (1988) 8383
6. Barranco A., Mejias J.A., Espinos J.P., Caballero A., Gonzalez-Elipe A.R., and Yubero F. J. Vac. Sci. Technol. A 19 (2000) 136
7. Kahler U., and Hofmeister H. Opt. Mater. 17 (2001) 83
8. Rochet F., Dufour G., Roulet H., Pelloie B., Perrière J., Fogarrassy E., Slaoui A., and Froment M. Phys. Rev. B 37 (1988) 6468
9. Grunthaner F.J., Grunthaner P.J., Vasquez R.P., Lewis B.F., and Maserjian J. Phys. Rev. Lett. 43 (1979) 1683
10. Kirk C.T. Phys. Rev. B 38 (1988) 1255
11. Lange P. J. Appl. Phys. 66 (1989) 201
12. Hinds B.J., Wang F., Wolfe D.M., Hinkle C.L., and Lukovsky G. J. Vac. Sci. Technol. B 16 (1998) 2171
13. Hollinger G., and Himpsel F.J. Appl. Phys. Lett. 44 (1983) 93
14. Himpsel F.J., McFeely F.R., Taleb-Ibrahimi A., Yarmoff J.A., and Hollinger G. Phys. Rev. B 38 (1988) 6084
15. Oh J.H., Yeom H.W., Hagimoto Y., Ono K., Oshima M., Hirashita N., Nywa N., Toriumi A., and Kakizaki A. Phys. Rev. B 63 (2001) 205310
16. Devine R.A.B. Appl. Phys. Lett. 68 (1996) 3108
17. Philipp H.R. J. Phys. Chem. Solids 32 (1971) 1935
18. Iacona F., Lombardo S., and Campisano S.U. J. Vac. Sci. Technol. B 14 (1996) 2693
19. Hinds B.J., Wang F., Wolfe D.M., Hinkle C.L., and Lukovsky G. J. Vac. Sci. Technol. B 16 (1998) 2171
20. Kanemitsu Y., Ogewa T., Shiraishi K., and Takeda K. Phys. Rev. B 48 (1993) 4883
21. Daldosso N., Luppi M., Ossicini S., Degoli E., Magri R., Dalba G., Fornasini P., Grisenti R., Rocca F., Pavesi L., Boninelli S., Priolo F., Spinella C., and Iacona F. Phys. Rev. B 68 (2003) 085327
22. Pai P.G., Chao S.S., Takagi Y., and Lucovsky G. J. Vac. Sci. Technol. A 4 (1986) 689
23. Queeney K.T., Weldon M.K., Chang J.P., Chabal Y.J., Gurevich A.B., Sapjeta J., and Opila R.L. J. Appl. Phys. 87 (2000) 1323