Chemical stability of Sin+species in SiOx(x<2) thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 19, Issue 1, 2001, Pages 136-144

  Barranco, A ^a   Mejias J A ^b   Espinos J P ^a   Caballero, A ^a   Gonzalez Elipe A R ^a   Yubero, F ^a  

^a INSTITUTO DE CIENCIA DE MATERIALES DE SEVILLA   (Spain)

^b UNIVERSIDAD PABLO DE OLAVIDE   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; EVAPORATION; OXIDATION; OXYGEN; PARTIAL PRESSURE; SILICA; STOICHIOMETRY; SYNCHROTRON RADIATION; ULTRAHIGH VACUUM; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL STABILITY; DISPROPORTIONATION REACTION; EXTENDED X RAY ABSORPTION FINE STRUCTURE ANALYSIS; SYNCHROTRON PHOTOEMISSION; X RAY ABSORPTION SPECTROSCOPY;

THIN FILMS;

EID: 0035105543     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1323972     Document Type: Article

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