-
1
-
-
29044440093
-
FinFET: a self-aligned double-gate MOSFET scalable to 20 nm
-
Hisamoto D., Lee W.-C., Kedzierski J., Takeuchi H., Asano K., Kuo C., et al. FinFET: a self-aligned double-gate MOSFET scalable to 20 nm. IEEE Trans Electron Dev 47 12 (2000) 2320-2325
-
(2000)
IEEE Trans Electron Dev
, vol.47
, Issue.12
, pp. 2320-2325
-
-
Hisamoto, D.1
Lee, W.-C.2
Kedzierski, J.3
Takeuchi, H.4
Asano, K.5
Kuo, C.6
-
2
-
-
21044449128
-
Analysis of the parasitic S/D resistance in MuGFETs
-
Dixit A., Kottantharayil A., Collaert N., Goodwin M., Jurczak M., and De Meyer K. Analysis of the parasitic S/D resistance in MuGFETs. IEEE Trans Electron Dev 52 6 (2005) 1132-1140
-
(2005)
IEEE Trans Electron Dev
, vol.52
, Issue.6
, pp. 1132-1140
-
-
Dixit, A.1
Kottantharayil, A.2
Collaert, N.3
Goodwin, M.4
Jurczak, M.5
De Meyer, K.6
-
3
-
-
17644378104
-
Perspectives of FinFETs for analog applications
-
Kilchytska V., Collaert N., Rooyackers R., Lederer D., Raskin J.-P., and Flandre D. Perspectives of FinFETs for analog applications. Proc ESSDERC 48 (2004) 65-68
-
(2004)
Proc ESSDERC
, vol.48
, pp. 65-68
-
-
Kilchytska, V.1
Collaert, N.2
Rooyackers, R.3
Lederer, D.4
Raskin, J.-P.5
Flandre, D.6
-
4
-
-
33751214764
-
-
Lederer D, Parvais B, Mercha A, Collaert N, Jurczak M, Raskin J-P, et al. Dependence of FinFET RF performance on fin width. In: sixth topical meeting on silicon monolithic integrated circuits in RF systems (SiRF06); 2006. p. 8-11.
-
-
-
-
5
-
-
0020830319
-
Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFETs
-
Lim H.-K., and Fossum J.G. Threshold voltage of thin-film silicon-on-insulator (SOI) MOSFETs. IEEE Trans Electron Dev ED-30 10 (1983) 1244-1251
-
(1983)
IEEE Trans Electron Dev
, vol.ED-30
, Issue.10
, pp. 1244-1251
-
-
Lim, H.-K.1
Fossum, J.G.2
-
6
-
-
10844274144
-
Body effect in tri- and pi-gate SOI MOSFETs
-
Frei J., Johns C., Vazquez A., Xiong W., Cleavelin C.R., Chaudhary N., et al. Body effect in tri- and pi-gate SOI MOSFETs. IEEE Electron Dev Lett 25 12 (2004) 813-815
-
(2004)
IEEE Electron Dev Lett
, vol.25
, Issue.12
, pp. 813-815
-
-
Frei, J.1
Johns, C.2
Vazquez, A.3
Xiong, W.4
Cleavelin, C.R.5
Chaudhary, N.6
-
8
-
-
34047247349
-
-
Kilchytska V, Rudenko T, Flandre D. Electrical characterization of FinFETs: special aspects. In: Seventh international symposium on diagnostics and yield; 2006.
-
-
-
-
9
-
-
33751441246
-
-
Rudenko T, Kilchytska V, Collaert N, De Gendt S, Rooyackers R, Jurczak M, et al. Specific features of the capacitance and mobility behaviors in FinFET structures. In: Proceedings of the European solid state device research conference (ESSDERC); 2005. p. 85-8.
-
-
-
-
10
-
-
1442360362
-
Multiple-gate SOI MOSFETs
-
Colinge J.-P. Multiple-gate SOI MOSFETs. Solid State Electron 48 (2004) 897-905
-
(2004)
Solid State Electron
, vol.48
, pp. 897-905
-
-
Colinge, J.-P.1
-
11
-
-
0015650818
-
Investigation of the MOST channel conductance in weak inversion
-
Koomen J. Investigation of the MOST channel conductance in weak inversion. Solid State Electron 16 (1973) 801-810
-
(1973)
Solid State Electron
, vol.16
, pp. 801-810
-
-
Koomen, J.1
-
12
-
-
5444219526
-
CMOS circuit performance enhancement by surface orientation optimization
-
Chang L., Ieong M., and Yang M. CMOS circuit performance enhancement by surface orientation optimization. IEEE Trans Electron Dev 51 10 (2004) 1621-1627
-
(2004)
IEEE Trans Electron Dev
, vol.51
, Issue.10
, pp. 1621-1627
-
-
Chang, L.1
Ieong, M.2
Yang, M.3
-
13
-
-
0030241665
-
A novel technique to determine the gate and drain bias dependent series resistance in drain engineered MOSFETs using one single device
-
Otten J., and Klaassen F. A novel technique to determine the gate and drain bias dependent series resistance in drain engineered MOSFETs using one single device. IEEE Trans Electron Dev 43 9 (1996) 1478-1488
-
(1996)
IEEE Trans Electron Dev
, vol.43
, Issue.9
, pp. 1478-1488
-
-
Otten, J.1
Klaassen, F.2
-
14
-
-
49749131836
-
A physical model for MOSFET output resistance
-
Huang J.H., Liu Z.H., Jeng M.C., Ko P.K., and Hu C. A physical model for MOSFET output resistance. IEDM Tech Dig (1992) 569-572
-
(1992)
IEDM Tech Dig
, pp. 569-572
-
-
Huang, J.H.1
Liu, Z.H.2
Jeng, M.C.3
Ko, P.K.4
Hu, C.5
-
16
-
-
0025398785
-
A unified model for the flicker noise in metal-oxide-semiconductor field effect transistors
-
Hung K.K., Ko P.K., Hu C., and Cheng Y.C. A unified model for the flicker noise in metal-oxide-semiconductor field effect transistors. IEEE Trans Electron Dev 37 3 (1990) 654-665
-
(1990)
IEEE Trans Electron Dev
, vol.37
, Issue.3
, pp. 654-665
-
-
Hung, K.K.1
Ko, P.K.2
Hu, C.3
Cheng, Y.C.4
-
17
-
-
0025509533
-
Selective epitaxial growth of silicon and some potential applications
-
Ginsberg B.J., Burghartz J., Bronner G.B., and Mader S.R. Selective epitaxial growth of silicon and some potential applications. IBM J Res Dev 34 6 (1990) 816-827
-
(1990)
IBM J Res Dev
, vol.34
, Issue.6
, pp. 816-827
-
-
Ginsberg, B.J.1
Burghartz, J.2
Bronner, G.B.3
Mader, S.R.4
|