Calibration of boron concentration in CVD single crystal diamond combining ultralow energy secondary ions mass spectrometry and high resolution X-ray diffraction

Diamond and Related Materials

Volumn 16, Issue 4-7 SPEC. ISS., 2007, Pages 809-814

  Guzman de la Mata B ^a   Sanz Hervas A ^b   Dowsett, M G ^a   Schwitters, M ^c   Twitchen, D ^c  

^a UNIVERSITY OF WARWICK   (United Kingdom)

^b UNIVERSIDAD POLITÉCNICA DE MADRID   (Spain)

^c ELEMENT SIX LTD   (United Kingdom)

Author keywords

Boron doping; HRXRD; Single Crystal Diamond; uleSIMS

Indexed keywords

BORON; CHEMICAL VAPOR DEPOSITION; CONCENTRATION (PROCESS); SINGLE CRYSTALS;

BORON DOPING; IONIZATION PROBABILITY; RELATIVE SENSITIVITY FACTOR (RSF); SINGLE CRYSTAL DIAMOND;

DIAMONDS;

EID: 34047244198     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.11.043     Document Type: Article

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