Preparation of CeO2 nanoparticles and their chemical mechanical polishing as abrasives

Mocaxue Xuebao/Tribology

Volumn 27, Issue 1, 2007, Pages 1-5

  Li, Xia Zhang ^a   Chen, Yang ^b   Chen, Zhi Gang ^b   Chen, Jian Qing ^c   Ni, Chao Ying ^d  

^a JIANGSU UNIVERSITY   (China)

^b CHANGZHOU UNIVERSITY   (China)

^c HOHAI UNIVERSITY   (China)

^d UNIVERSITY OF DELAWARE   (United States)

Author keywords

Abrasive size; Chemical mechanical polishing; GaAs; Nanometer CeO2

Indexed keywords

ABRASIVES; CERIUM COMPOUNDS; MODELS; NANOPARTICLES; POWDERS; SEMICONDUCTING GALLIUM ARSENIDE; SURFACE ROUGHNESS;

ABRASIVE SIZE; CEO2 NANOPARTICLES; CERIUM NITRATE; GAAS WAFER; HEXAMETHYLENETETRAMINE; NANOMETER CEO2; POLISHING SLURRY; SOLID SOLID CONTACT MODELS; STARTING MATERIALS;

CHEMICAL MECHANICAL POLISHING;

EID: 34047227856     PISSN: 10040595     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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