Programmable nanolithography with plasmon nanoparticle arrays

Nano Letters

Volumn 7, Issue 3, 2007, Pages 745-749

  Koenderink, A Femius ^a   Hernández, Jesus V ^b   Robicheaux, Francis ^b   Noordam, L D ^c   Polman, Albert ^a  

^a FOM INSTITUTE AMOLF   (Netherlands)

^b AUBURN UNIVERSITY   (United States)

^c UNIVERSITY OF AMSTERDAM   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

DIPOLE MODEL; NANOPARTICLE ARRAYS; OPTICAL CONTACT LITHOGRAPHY; PROGRAMMABLE NANOLITHOGRAPHY;

LIGHT POLARIZATION; NANOPARTICLES; PHOTOMASKS; PLASMONS;

NANOLITHOGRAPHY;

LIGHT; LITHOGRAPHY; MASKING; PLASMA;

EID: 34047119350     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0630034     Document Type: Article

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