Chemical patterning of sub-50-nm half pitches via nanoimprint lithography

Microelectronic Engineering

Volumn 78-79, Issue 1-4, 2005, Pages 682-688

  Park, Sunggook ^a   Saxer, Sina ^a   Padeste, Celestino ^a   Solak, Harun H ^a   Gobrecht, Jens ^a   Schift, Helmut ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

Chemical patterns; Nanoimprint lithography; Protein patterns; Silanes

Indexed keywords

CHEMICAL MODIFICATION; CONTAMINATION; LITHOGRAPHY; PROTEINS; SENSITIVITY ANALYSIS; SILANES; ULTRAVIOLET RADIATION;

CHEMICAL PATTERNS; NANOIMPRINT LITHOGRAPHY; PROTEIN PATTERNS; SPATIAL RESOLUTION;

NANOTECHNOLOGY;

EID: 14944375353     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2004.12.085     Document Type: Conference Paper

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