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Volumn 53, Issue 1, 2006, Pages 119-124

Studies of the reverse read method and second-bit effect of 2-bit/cell nitride-trapping device by quasi-two-dimensional model

Author keywords

2 bit cell; Local drain induced barrier lowering (DIBL); NROM; Reverse read method; Second bit effect; Short channel effect

Indexed keywords

LOCAL DRAIN-INDUCED BARRIER LOWERING (DIBL); REVERSE READ METHODS; SECOND-BIT EFFECTS; SHORT CHANNEL EFFECTS;

EID: 33947618498     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2005.860644     Document Type: Article
Times cited : (36)

References (11)
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  • 3
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  • 4
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    • Novel soft erase and re-fill methods for a P+-poly gate nitride trapping nonvolatile memory device with excellent endurance and retention properties
    • H. T. Lue, Y. H. Shih, K. Y. Hsieh, R. Liu, and C. Y. Lu, "Novel soft erase and re-fill methods for a P+-poly gate nitride trapping nonvolatile memory device with excellent endurance and retention properties," in Pwc. IRPS, 2005, pp. 168-174.
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  • 5
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    • Characterization of channel hot electron injection by the subthreshold slope of NROM device
    • May
    • E. Lusky, Y. S. Diamand, I. Bloom, and B. Eitan, "Characterization of channel hot electron injection by the subthreshold slope of NROM device," IEEE Electron Device Lett., vol. 23, no. 5, pp. 556-558, May 2001.
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    • L. Larcher, G. Verzellesi, P. Pavan, E. Lusky, I. Bloom, and B. Eitan, "Impact of programming charge distribution on the threshold voltage and subthreshold slope of NROM memory cells," IEEE Trans. Electron Devices, vol. 49, no. 11, pp. 1939-1946, Nov. 2002.
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  • 7
    • 1342308176 scopus 로고    scopus 로고
    • Modeling of second-bit effect of a nitride based trapping storage Flash EEPROM cell under two-bit operation
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    • Y. W. Chang, T. C. Lu, S. Pam, and C. Y. Lu, "Modeling of second-bit effect of a nitride based trapping storage Flash EEPROM cell under two-bit operation," IEEE Electron Device Lett., vol. 25, no. 1, pp. 95-97, Jan. 2004.
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  • 10
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    • H. T. Lue, Y. H. Shih, K. Y. Hsieh, R. Liu, and C. Y. Lu, "A transient analysis method to characterize the trap vertical location in nitride trapping device," IEEE Electron Device Lett., vol. 25, no. 10, pp. 816-818, Oct. 2004.
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.