Physical vapour deposition of alkyl phosphonic acid on mica and HOPG investigated by NC-AFM

Nanotechnology

Volumn 18, Issue 8, 2007, Pages

  Loppacher, Ch ^a   Zerweck, U ^a   Koehler, D ^a   Rodenstein, M ^a   Jaehne, E ^a   Luther, R ^a   Adler, H J ^a   Eng, L M ^a  

^a DRESDEN UNIVERSITY OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ALKYL PHOSPHONIC ACID; BILAYERS; HIGHLY ORIENTED PYROLYTIC GRAPHITE (HOPG);

ANNEALING; ATOMIC FORCE MICROSCOPY; FILM THICKNESS; GRAPHITE; PHYSICAL VAPOR DEPOSITION; SELF ASSEMBLED MONOLAYERS;

MICA;

GRAPHITE; HIGH ORIENTED PYROLYTIC GRAPHITE; MICA; OCTADECYLPHOSPHONIC ACID; PHOSPHONIC ACID DERIVATIVE; UNCLASSIFIED DRUG;

ATOMIC FORCE MICROSCOPY; CONFERENCE PAPER; IMMERSION; NONCONTACT ATOMIC FORCE MICROSCOPY; PRIORITY JOURNAL; VAPOR;

EID: 33947503129     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/18/8/084003     Document Type: Conference Paper

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