Immersion lithography for 45nm manufacturing

Microlithography World

Volumn 16, Issue 1, 2007, Pages

  Owa, Soichi ^a   Hazelton, Andrew J ^a   Magoon, Holly H ^b  

^a NIKON CORPORATION   (Japan)

^b NIKON PRECISION INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

INDUSTRY; PRINTING MACHINERY; PRODUCTIVITY; SCANNING;

INTENSIVE IMMERSION SCANNER; LITHO SCANNER;

LITHOGRAPHY;

EID: 33947415347     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (11)

1. M. Okumura et al., "Mass Production Level ArF Immersion Exposure Tool," Optical Microlithography, SPIE, Vol. 6154, pp. 61541U-1 to -8, 2006.
2. S. Owa et al., "Current Status and Future Prospect of Immersion Lithography," Optical Microlithography, SPIE, Vol. 6154, pp. 615408-1 to -12, 2006.
3. T. Matsuyama et al., "The Lithographic Lens: Its History and Evolution," Optical Microlithography, SPIE, Vol. 6154, pp. 615403-1 to -13, 2006.
4. T. Matsuyama et al., "Hyper-NA Catadioptric Projection Lens for 1.3NA Immersion Tool," 3rd Int'l Symp. on Immersion Litho., Kyoto, Japan, Oct. 06.
5. H. Nishinaga et al., "Development of Polarized-Light Illuminator and Its Impact," Optical Microlithography, SPIE, Vol. 5754, pp. 669-680, 2005.
6. H. Ikezawa et al., "A Hyper-NA Projection Lens for ArF Immersion Exposure Tool," Optical Microlithography, SPIE, Vol. 6154, pp. 615421-1 to -8, 2006.
7. K. Ozawa et al., "Effect of Azimuthally Polarized Illumination Imaging on Device Patterns Beyond the 45nm Node," Optical Microlithography, SPIE, Vol. 6154, pp. 61540C-1 to 61540C-12, 2006.
8. T. Fujiwara et al., "Latest Status of Immersion Exposure Tools for Device Mass Production," 3rd International Symposium on Immersion Lithography, Kyoto, Japan, October 2006
9. S. Owa et al., "Full Field Exposure Tools for Immersion Lithography," Optical Microlithography, SPIE, Vol. 5754, pp. 655-668, 2005.
10. R. Pforr et al., "Polarized Light for Resolution Enhance at 70nm and Beyond,:Optical Microlithgraphy, SPIE, Vol. 5754, pp. 92-106, 2005.
11. Nakano et al., "Analysis and Improvement of Defectivity in Immersion," Optical Microlithography, SPIE, Vol. 6154, pp. 61544J-1 to -12, 2006.