Development of polarized-light illuminator and its impact

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5754, Issue PART 2, 2005, Pages 669-680

  Nishinaga, Hisashi ^a   Tokuda, Noriaki ^a   Owa, Soichi ^a   Hirukawa, Shigeru ^a   Tanitsu, Osamu ^a   Kudo, Takehito ^a   Tanaka, Hirohisa ^a  

^a NIKON CORPORATION   (Japan)

Author keywords

Dose margin; Image contrast; Lithography; Polarized illumination; Resolution; Scanner

Indexed keywords

COMPUTER SIMULATION; LIGHT POLARIZATION; LITHOGRAPHY; MASKS; OPTICAL RESOLVING POWER; OPTICAL SYSTEMS; OPTIMIZATION;

DOSE MARGIN; IMAGE CONTRAST; POLARIZED ILLUMINATION; RESOLUTION; SCANNER;

LIGHTING;

EID: 23044509988     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.599356     Document Type: Conference Paper

References (3)

1. T. Matsuyama, T. Nakashima, "Study on high NA imaging with polarized illumination", SPIE5754-117, OPTICAL MICROLITHOGRAPHY XVIII, 1-4 March 2005.
2. S. Owa, H. Nagasaka, Y. Ishii, K. Shiraishi, S. Hirukawa, "Full-field exposure tools for immersion lithography", SPIE5754-63, OPTICAL MICROLITHOGRAPHY XVIII, 1-4 March 2005.
3. Toru Fujii, Naonori Kita, Yasushi Mizuno, "On Board Polarization Measuring Instrument for High NA Excimer Scanner", SPIE5752-88, OPTICAL MICROLITHOGRAPHY XVIII, 1-4 March 2005.