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Volumn 32, Issue 8, 2007, Pages 997-999

Comparative extreme ultraviolet emission measurements for lithium and tin laser plasmas

Author keywords

[No Author keywords available]

Indexed keywords

PLANAR SOLIDS; TIN LASER PLASMAS; ULTRAVIOLET EMISSION;

EID: 33947391276     PISSN: 01469592     EISSN: None     Source Type: Journal    
DOI: 10.1364/OL.32.000997     Document Type: Article
Times cited : (27)

References (19)
  • 7
    • 0038203233 scopus 로고
    • Characterization of a lithium laser produced plasma at 135 Å for extreme ultraviolet projection lithography,
    • M.S. thesis University of Central Florida
    • D. J. O'Connell, "Characterization of a lithium laser produced plasma at 135 Å for extreme ultraviolet projection lithography," M.S. thesis (University of Central Florida, 1994).
    • (1994)
    • O'Connell, D.J.1
  • 10
    • 84894001881 scopus 로고    scopus 로고
    • FC2: Calibration of a EUV Source at PLEX LLC (International SEMATECH Technology Transfer no. 04024490A-TR).
    • "FC2: Calibration of a EUV Source at PLEX LLC" (International SEMATECH Technology Transfer no. 04024490A-TR).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.