Intense EUV incoherent plasma sources for EUV lithography and other applications

IEEE Journal of Quantum Electronics

Volumn 35, Issue 5, 1999, Pages 700-708

  Silfvast, William T ^a,b,c,d  

^a UNIVERSITY OF CENTRAL FLORIDA   (United States)

^b UNIVERSITY OF UTAH   (United States)

^c UNIVERSITY OF OXFORD   (United Kingdom)

^d STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER PRODUCED PLASMAS; ULTRAVIOLET RADIATION; X RAY LITHOGRAPHY;

EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL); INCOHERENT PLASMA SOURCES;

PLASMA SOURCES;

EID: 0032653189     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/3.760316     Document Type: Article

References (10)

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