A fabrication method for reduction of silicide contamination in polycrystalline-silicon thin-film transistors

Electrochemical and Solid-State Letters

Volumn 10, Issue 5, 2007, Pages 142-144

  Song, Nam Kyu ^a   Kim, Young Su ^a   Kim, Min Sun ^a   Han, Shin Hee ^a   Joo, Seung Ki ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; CRYSTALLIZATION; DEGRADATION; ELECTRIC PROPERTIES; LEAKAGE CURRENTS; NICKEL COMPOUNDS; POLYSILICON; SILICIDES;

CHANNEL REGION; FIELD-EFFECT MOBILITY; METAL-INDUCED LATERAL CRYSTALLIZATION (MILC);

THIN FILM TRANSISTORS;

EID: 33947305105     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2710962     Document Type: Article

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