Erratum to "Fabrication of 2D ordered arrays of cobalt silicide nanodots on (0 0 1)Si substrates". [J. Crystal Growth 300 (2007) 473-477] (DOI:10.1016/j.jcrysgro.2006.12.023);Fabrication of 2D ordered arrays of cobalt silicide nanodots on (0 0 1)Si substrates

Journal of Crystal Growth

Volumn 300, Issue 2, 2007, Pages 473-477

  Cheng, S L ^a   Lu, S W ^a   Wong, S L ^a   Chang, C C ^a   Chen, H ^a  

^a NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

A1. Nanosphere lithography; A1. Self assembly; A3. Epitaxy; B1. Cobalt silicide; B1. Nanodots

Indexed keywords

ANNEALING; COBALT COMPOUNDS; CRYSTALLINE MATERIALS; ELECTRON DIFFRACTION; EPITAXIAL GROWTH; NANOLITHOGRAPHY; POLYSTYRENES; SELF ASSEMBLY; SILICON;

COBALT SILICIDE; NANODOTS;

NANOSTRUCTURES;

EID: 33947172772     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2007.03.018     Document Type: Erratum

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