Structural relationship of polycrystalline cobalt suicide lines to (001) silicon substrate

Applied Physics Letters

Volumn 75, Issue 19, 1999, Pages 2924-2926

  Alberti, A ^a   La Via, F ^b   Spinella, C ^b   Rimini, E ^a  

^a UNIVERSITY OF CATANIA   (Italy)

^b CNR IMETEM   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001092733     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125191     Document Type: Article

References (9)

1. Thin Films Interdiffusion and Reactions, edited by J. M. Poate, K. N. Tu, and J. W. Mayer (Wiley, New York, 1978).
2. R. T. Tung, J. C. Bean, J. M. Gibbson, J. M. Poate, and D. C. Jacobson, Appl. Phys. Lett. 40, 684 (1982).
3. M. F. Wu, A. Vantomme, G. Langouche, K. Maex, H. Vanderstraeten, and Y. Bruynseraede, Appl. Phys. Lett. 57, 1973 (1990).
4. M. L. A. Dass, D. B. Fraser, and C. S. Way, Appl. Phys. Lett. 58, 1308 (1991).
5. O. P. Karpenko and S. Yalisove, Appl. Phys. 80, 6211 (1996).
6. S. Mantl, Mater. Sci. Rep. 8, 1 (1992).
7. F. LaVia, A. H. Reader, J. P. W. B. Duchateau, E. P. Naburgh, and D. J. Oostra, J. Vac. Sci. Technol. B 10, 2284 (1992).
8. S. Mantl, Mater. Sci. Rep. 8, 1 (1992).
9. A. H. Reader, J. P. W. B. Duchateau, and J. E. Crombeen, J. Vac. Sci. Technol. 8, 1204 (1993).