Analysis of the magnetic field in the end region of the rectangular planar DC magnetron sputtering apparatus

Zhongguo Dianji Gongcheng Xuebao/Proceedings of the Chinese Society of Electrical Engineering

Volumn 26, Issue SUPPL., 2006, Pages 119-124

  Qiu, Qing Quan ^a   Li, Qing Fu ^a   Yu, Jiao ^b   Finely, Jim ^b  

^a XI'AN JIAOTONG UNIVERSITY   (China)

^b PPG INDUSTRIES   (United States)

Author keywords

Design; Improvement; Magnetic field; Magnetron sputtering; Permanent magnet; Plasma

Indexed keywords

ELECTRONS; EROSION; MAGNETIC FIELDS; PERMANENT MAGNETS; PLASMAS;

ANOMALOUS EROSION; ELECTRONS DRIFT; RECTANGULAR PLANAR;

MAGNETRON SPUTTERING;

EID: 33947168839     PISSN: 02588013     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (11)

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