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Volumn 17, Issue 5, 1999, Pages 3118-3120

Measuring the magnetic field distribution of a magnetron sputtering target

Author keywords

[No Author keywords available]

Indexed keywords


EID: 0033456563     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582013     Document Type: Article
Times cited : (4)

References (7)
  • 4
    • 0038854798 scopus 로고
    • edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood Noyes, Park Ridge, NJ
    • S. M. Rossnagel, in Handbook of Plasma Processing Technology, edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood (Noyes, Park Ridge, NJ, 1990), p. 160.
    • (1990) Handbook of Plasma Processing Technology , pp. 160
    • Rossnagel, S.M.1
  • 6
    • 0348009836 scopus 로고
    • Burr-Brown, Tucson, AZ
    • Integrated Circuits Data Book (Burr-Brown, Tucson, AZ, 1989), Vol. 33.
    • (1989) Integrated Circuits Data Book , vol.33
  • 7
    • 85034551973 scopus 로고    scopus 로고
    • Linear Hall effect IC, RS stock No. 304-267
    • Linear Hall effect IC, RS stock No. 304-267.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.