Surface oxidation of Si assisted by irradiation with large gas cluster ion beam in an oxygen atmosphere

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 256, Issue 1, 2007, Pages 350-353

  Ichiki, K ^a   Ninomiya, S ^a   Seki, T ^a   Aoki, T ^a   Matsuo, J ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

Cluster ion bombardment; QMS; Secondary ion; SIMS; Surface oxidation

Indexed keywords

CURRENT DENSITY; ION BEAMS; ION BOMBARDMENT; OXIDATION; SECONDARY ION MASS SPECTROMETRY; STOICHIOMETRY; SURFACE TREATMENT;

CLUSTER ION BOMBARDMENT; OXYGEN PARTIAL PRESSURE; SECONDARY IONS; SURFACE OXIDATION;

SILICON;

EID: 33947119564     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.12.026     Document Type: Article

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