Gas cluster ion beam infusion processing of semiconductors

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 242, Issue 1-2, 2006, Pages 427-430

  MacCrimmon, R ^a   Hautala, J ^a   Gwinn, M ^a   Sherman, S ^a  

^a Epion Corporation   (United States)

Author keywords

Boron doping; Clusters; Etching; GCIB; Smoothing; Thin film deposition

Indexed keywords

ETCHING; INTEGRATED CIRCUITS; ION BEAMS; SEMICONDUCTOR JUNCTIONS; SURFACE TREATMENT;

GAS CLUSTER ION BEAM (GCIB); INFUSION; JUNCTION FORMATION; SUBTRACTIVE PROCESSING;

SEMICONDUCTOR MATERIALS;

EID: 28544446944     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2005.08.074     Document Type: Conference Paper

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