Self-assembling resists for nanolithography

Technical Digest - International Electron Devices Meeting, IEDM

Volumn 2005, Issue , 2005, Pages 356-359

  Nealey, Paul F ^a   Edwards, Erik W ^a   Müller, Marcus ^a   Stoykovich, Mark P ^a   Solak, Harun H ^b   De Pablo, Juan J ^a  

^a University of Wisconsin Madison   (United States)

^b PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

NANOLITHOGRAPHY; SELF ASSEMBLY; SEMICONDUCTOR MATERIALS;

NANOSCALE PATTERNED RESISTS;

BLOCK COPOLYMERS;

BLOCK COPOLYMERS; LITHOGRAPHY; SEMICONDUCTORS;

EID: 33847751468     PISSN: 01631918     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

1. International Technology Roadmap for Semiconductors, 2004 Update.
2. D. J. C. Herr, "The extensibility of optical patterning via directed self-assembly of nano-engineered imaging materials," Future Fab Intl., 18, (January 12, 2005).
3. T. K. Kim, X. M. Yang, R. D. Peters, B. H. Sohn, P. F. Nealey., "Chemical modification of self-assembled monolayers by exposure to soft x-rays in air," J. Phys. Chem. B, 104, 7403 (2000).
4. R. D. Peters, X. M. Yang, T. K. Kim, B. H. Sohn, P. F. Nealey, "Using self-assembled monolayers exposed to x-rays to control the wetting behavior of thin films of block copolymers," Langmuir, 16, 4625 (2000).
5. X. M. Yang, R. D. Peters, P. F. Nealey, H. H. Solak, F. Cerrina, "Guided self-assembly of symmetric diblock copolymer films on chemically nanopatterned substrates," Macromolecules, 33(26), 9575 (2000).
6. S. O. Kim, H. H. Solak, M. P. Stoykovich, N. L. Ferrier, J. J. de Pablo, P. F. Nealey, "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates," Nature, 424(6947), 411 (2003).
7. P. Mansky, Y. Liu, E. Huang, C. J. Hawker, T. P. Russell, "Controlling polymer-surface interactions with random copolymer brushes," Science, 275, 1458 (1997).
8. E. W. Edwards, M. F. Montague, H. H. Solak, C. J. Hawker, P. F. Nealey, "Precise control over molecular dimensions of block-compolymer domains using the interfacial energy of chemically nanopatterned substrates," Adv. Mater., 16, 1315 (2004).
9. M. P. Stoykovich, M. Muller, S. O. Kim, H. H. Solak, E. W. Edwards, J. J. de Pablo, P. F. Nealey, "Directed assembly of block copolymer blends into nonregular device-oriented structures," Science, 308, 1442 (2005).
10. Q. Wang, S. K. Nath, M. D. Graham, P. F. Nealey, J. J. de Pablo, "Symmetric diblock copolymer thin films confined between homogeneous and patterned surfaces: Simulations and theory," J. Chem. Phys., 112(22), 9996 (2000).
11. H. H. Solak et al., "Sub-50 nm period patterns with EUV interference lithography," Microelectron. Eng., 67-8, 56 (2003).
12. M. Mueller, G. D. Smith, "Phase separation in binary mixtures containing polymers: A quantitative comparison of single-chain-in-mean-field simulations and computer simulations of the corresponding multichain systems," J. Poly. Sci. B - Poly. Phys., 43(8), 934 (2005).