On the pressure limits of diamond chemical vapor deposition

Diamond and Related Materials

Volumn 5, Issue 12, 1996, Pages 1503-1508

  Wolden, C A ^a,b   Gleason, K K ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b North Carolina State University   (United States)

Author keywords

Atomic hydrogen; Growth; Low pressure; Modeling

Indexed keywords

EID: 0042078253     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(96)00574-2     Document Type: Article

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