Statistical analysis of electromigration lifetimes and void evolution

Journal of Applied Physics

Volumn 101, Issue 4, 2007, Pages

  Hauschildt, M ^a   Gall, M ^a   Thrasher, S ^a   Justison, P ^a   Hernandez, R ^a   Kawasaki, H ^a   Ho, P S ^b  

^a FREESCALE SEMICONDUCTOR INC   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMIGRATION LIFETIMES; GEOMETRICAL VARIATIONS; SIGMA VALUES; STATISTICAL CORRELATION; VOID SIZES;

DIFFUSION; DISTRIBUTION FUNCTIONS; MASS TRANSFER; STATISTICAL METHODS;

ELECTROMIGRATION;

EID: 33847614307     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2655531     Document Type: Article

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