Mn-doped AlN nanowires with room temperature ferromagnetic ordering

Applied Physics Letters

Volumn 90, Issue 9, 2007, Pages

  Yang, Y ^c   Zhao, Q ^c   Zhang, X Z ^c   Liu, Z G ^c   Zou, C X ^c   Shen, B ^c   Yu, D P ^a,b  

^a PEKING UNIVERSITY   (China)

^b Institute of Heavy Ion Physics   (China)

^c NONE

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM COMPOUNDS; CHEMICAL VAPOR DEPOSITION; DOPING (ADDITIVES); FERROMAGNETIC MATERIALS; MAGNETIZATION; MANGANESE COMPOUNDS; PHOTOLUMINESCENCE;

FERROMAGNETIC PROPERTIES; LOW TEMPERATURE PHOTOLUMINESCENCE; ROOM TEMPERATURE; SPINTRONIC NANODEVICES;

NANOWIRES;

EID: 33847614243     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2475276     Document Type: Article

References (24)

1. H. Ohno, Science 281, 951 (1998).
2. R. Fiederling, M. Keim, G. Reuscher, W. Ossau, G. Schmidt, A. Waag, and L. W. Molenkamp, Nature (London) 402, 787 (1999).
3. Y. Ohno, D. K. Young, B. Beschoten, F. Matsukura, H. Ohno, and D. D. Awschalom, Nature (London) 402, 790 (1999).
4. H. Ohno, D. Chiba, F. Matsukura, T. Omiya, E. Abe, T. Dietl, and Y. Ohno, Nature (London) 408, 944 (2000).
5. T. Dietl, H. Ohno, F. Matsukura, J. Cibert, and D. Ferrand, Science 287, 1019 (2000).
6. K. Sato and H. Katayama-Yoshida, Physica E (Amsterdam) 10, 251 (2001).
7. Q. Wang, Q. Sun, and P. Jena, Phys. Rev. B 70, 052408 (2004).
8. R. Frazier, G. Thaler, J. Stapleton, C. R. Abernathy, S. J. Pearton, R. Rairigh, J. Kelly, A. Hebard, M. Nakaugi, K. Nam, J. Y. Lin, H. X. Jiang, J. M. Zavada, and R. G. Wilson, J. Appl. Phys. 94, 1592 (2003).
9. V. I. Litvinow and V. K. Dugaev, Phys. Rev. Lett. 86, 5593 (2001).
10. A. Y. Polyakov, N. B. Smirnov, A. V. Govorkov, R. M. Frazier, J. Y. Liefer, G. T. Thaler, C. R. Abernathy, S. J. Pearton, and J. M. Zavada, Appl. Phys. Lett. 85, 4067 (2004).
11. H. X. Liu, Stephen Y. Wu, R. K. Singh, Lin Gu, N. R. Dilley, L. Montes, and M. B. Simmonds, Appl. Phys. Lett. 85, 4076 (2004).
12. D. Kumar, J. Antifakos, M. G. Blamire, and Z. H. Barber, Appl. Phys. Lett. 84, 5004 (2004).
13. S. G. Yang, A. B. Pakhomov, S. T. Hung, and C. Y. Wong, Appl. Phys. Lett. 81, 2418 (2002).
14. R. M. Frazier, G. T. Thaler, C. R. Abernathy, and S. J. Pearton, Appl. Phys. Lett. 83, 1758 (2003).
15. Heon-Jin Choi, Han-kyu Seong, Joonyeon Chang, Kyeong-Il Lee, Young-Ju Park, Ju-Jin Kim, Sang-Kwon Lee, Rongrui He, Tevye Kuykendall, and Peidong Yang, Adv. Mater. (Weinheim, Ger.) 17, 1351 (2005).
16. F. L. Deepak, P. V. Vanitha, A. Govindaraj, and C. N. R. Rao, Chem. Phys. Lett. 82, 4564 (2003).
17. Doo Suk Han, Jeughee Park, Kung Won Rhie, Soonkyu Kim, and Joonyeon Chang, Appl. Phys. Lett. 86, 032506 (2005).
18. J. Y. Li, Z. Y. Qiao, X. L. Chen, Y. G. Cao, Y. C. Lan, and C. Y. Wang, Appl. Phys. A: Mater. Sci. Process. 71, 587 (2000).
19. A. Sato, K. Azumada, T. Atsumori, and K. Hara, Appl. Phys. Lett. 87, 021907 (2005).
20. A. L. Martin, C. M. Spalding, V. I. Dimitrova, P. G. Van Patten, M. L. Caldwell, M. E. Kordesch, and H. H. Richardson, J. Vac. Sci. Technol. A 19, 1894 (2001).
21. Moon-Ho Ham, Sukho Yoon, Yongjo Park, and Jae-Min Myoung, J. Cryst. Growth 271, 420 (2004).
22. G. H. Lee, S. H. Huh, J. W. Jeong, B. J. Choi, S. H. Kim, and H.-C. Ri, J. Am. Chem. Soc. 124, 12094 (2002).
23. W. S. Seo, H. H. Jo, K. Lee, B. Kim, S. J. Oh, and J. T. Park, Angew. Chem. 43, 1115 (2004).
24. Van. Schilfgaarde and O. N. Mryasov, Phys. Rev. B 63, 233205 (2001).